Structure of TiAlN reactive sputtered coatings
The Raman spectra, X-ray diffraction and hardness of the TiAlN films co-deposited on the steel substrates by reactive sputtering from Ti and Al targets in a mixture of N 2 + Ar gas with two magnetrons at room temperature have been studied. From Raman spectra it is found that the position of high-fre...
| Autores: | , , , , , , , , , , |
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| Tipo de recurso: | artículo |
| Estado: | Versión publicada |
| Fecha de publicación: | 2012 |
| País: | España |
| Institución: | Universidad de Sevilla (US) |
| Repositorio: | idUS. Depósito de Investigación de la Universidad de Sevilla |
| OAI Identifier: | oai:idus.us.es:11441/81584 |
| Acceso en línea: | https://hdl.handle.net/11441/81584 |
| Access Level: | acceso abierto |
| Palabra clave: | Coating Hardness Reactive Sputtering TiAlN X-Ray Diffraction Raman Spectroscopy |
| Sumario: | The Raman spectra, X-ray diffraction and hardness of the TiAlN films co-deposited on the steel substrates by reactive sputtering from Ti and Al targets in a mixture of N 2 + Ar gas with two magnetrons at room temperature have been studied. From Raman spectra it is found that the position of high-frequency bands in vibrational spectra was located at 700-730 cm -1 or in the region of 830 - 850 cm -1 depending on the deposition parameters whereas it is not exceed 630 cm -1 from TiAlN of NaCl structure. It is found the two-phase structure of coatings: a small quantity of NaCl-type structure of TiAlN (TiN) and the disordered structure of the chains of polyhedra [TiN x] with x = 5 and x = 4. The chains of polyhedra [TiN x] with x = 4 are mainly formed at large discharge power of Al(Ti) target or at small content of N 2 gas. |
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