Identifying the nature of surface chemical modification for directed self-assembly of block copolymers
In recent years, block copolymer lithography has emerged as a viable alternative technology for advanced lithography. In chemical-epitaxy-directed self-assembly, the interfacial energy between the substrate and each block copolymer domain plays a key role on the final ordering. Here, we focus on the...
| Autores: | , , , , , , , |
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| Tipo de recurso: | artículo |
| Fecha de publicación: | 2017 |
| País: | España |
| Institución: | Universitat Autònoma de Barcelona |
| Repositorio: | Dipòsit Digital de Documents de la UAB |
| Idioma: | inglés |
| OAI Identifier: | oai:ddd.uab.cat:186356 |
| Acceso en línea: | https://ddd.uab.cat/record/186356 https://dx.doi.org/urn:doi:10.3762/bjnano.8.198 |
| Access Level: | acceso abierto |
| Palabra clave: | Block copolymer Chemical guiding pattern Directed self-assembly Thin film X-ray photoemission spectroscopy |
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Identifying the nature of surface chemical modification for directed self-assembly of block copolymersEvangelio Araujo, LauraGramazio, FedericoLorenzoni, Matteo|||0000-0001-5287-8761Gorgoi, MichaelaEspinosa, Francisco MiguelGarcía, RicardoPérez-Murano, FrancescFraxedas, Jordi|||0000-0002-2821-4831Block copolymerChemical guiding patternDirected self-assemblyThin filmX-ray photoemission spectroscopyIn recent years, block copolymer lithography has emerged as a viable alternative technology for advanced lithography. In chemical-epitaxy-directed self-assembly, the interfacial energy between the substrate and each block copolymer domain plays a key role on the final ordering. Here, we focus on the experimental characterization of the chemical interactions that occur at the interface built between different chemical guiding patterns and the domains of the block copolymers. We have chosen hard X-ray high kinetic energy photoelectron spectroscopy as an exploration technique because it provides information on the electronic structure of buried interfaces. The outcome of the characterization sheds light onto key aspects of directed self-assembly: grafted brush layer, chemical pattern creation and brush/block co-polymer interface. 22017-01-0120172017-01-01Articlehttp://purl.org/coar/resource_type/c_6501VoRhttp://purl.org/coar/version/c_970fb48d4fbd8a85info:eu-repo/semantics/articleapplication/pdfhttps://ddd.uab.cat/record/186356https://dx.doi.org/urn:doi:10.3762/bjnano.8.198reponame:Dipòsit Digital de Documents de la UABinstname:Universitat Autònoma de BarcelonaInglésengEuropean Commission https://doi.org/10.13039/501100000780 619793European Commission https://doi.org/10.13039/501100000780 318804European Commission https://doi.org/10.13039/501100000780 288879Ministerio de Economía y Competitividad https://doi.org/10.13039/501100003329 TEC2015-69864-RMinisterio de Economía y Competitividad https://doi.org/10.13039/501100003329 SEV-2013-0295Ministerio de Economía y Competitividad https://doi.org/10.13039/501100003329 MAT2013-4458-RMinisterio de Educación y Ciencia FPU/13/03746open accesshttp://purl.org/coar/access_right/c_abf2Aquest document està subjecte a una llicència d'ús Creative Commons. Es permet la reproducció total o parcial, la distribució, la comunicació pública de l'obra i la creació d'obres derivades, fins i tot amb finalitats comercials, sempre i quan es reconegui l'autoria de l'obra original.https://creativecommons.org/licenses/by/4.0/info:eu-repo/semantics/openAccessoai:ddd.uab.cat:1863562026-06-06T12:50:31Z |
| dc.title.none.fl_str_mv |
Identifying the nature of surface chemical modification for directed self-assembly of block copolymers |
| title |
Identifying the nature of surface chemical modification for directed self-assembly of block copolymers |
| spellingShingle |
Identifying the nature of surface chemical modification for directed self-assembly of block copolymers Evangelio Araujo, Laura Block copolymer Chemical guiding pattern Directed self-assembly Thin film X-ray photoemission spectroscopy |
| title_short |
Identifying the nature of surface chemical modification for directed self-assembly of block copolymers |
| title_full |
Identifying the nature of surface chemical modification for directed self-assembly of block copolymers |
| title_fullStr |
Identifying the nature of surface chemical modification for directed self-assembly of block copolymers |
| title_full_unstemmed |
Identifying the nature of surface chemical modification for directed self-assembly of block copolymers |
| title_sort |
Identifying the nature of surface chemical modification for directed self-assembly of block copolymers |
| dc.creator.none.fl_str_mv |
Evangelio Araujo, Laura Gramazio, Federico Lorenzoni, Matteo|||0000-0001-5287-8761 Gorgoi, Michaela Espinosa, Francisco Miguel García, Ricardo Pérez-Murano, Francesc Fraxedas, Jordi|||0000-0002-2821-4831 |
| author |
Evangelio Araujo, Laura |
| author_facet |
Evangelio Araujo, Laura Gramazio, Federico Lorenzoni, Matteo|||0000-0001-5287-8761 Gorgoi, Michaela Espinosa, Francisco Miguel García, Ricardo Pérez-Murano, Francesc Fraxedas, Jordi|||0000-0002-2821-4831 |
| author_role |
author |
| author2 |
Gramazio, Federico Lorenzoni, Matteo|||0000-0001-5287-8761 Gorgoi, Michaela Espinosa, Francisco Miguel García, Ricardo Pérez-Murano, Francesc Fraxedas, Jordi|||0000-0002-2821-4831 |
| author2_role |
author author author author author author author |
| dc.subject.none.fl_str_mv |
Block copolymer Chemical guiding pattern Directed self-assembly Thin film X-ray photoemission spectroscopy |
| topic |
Block copolymer Chemical guiding pattern Directed self-assembly Thin film X-ray photoemission spectroscopy |
| description |
In recent years, block copolymer lithography has emerged as a viable alternative technology for advanced lithography. In chemical-epitaxy-directed self-assembly, the interfacial energy between the substrate and each block copolymer domain plays a key role on the final ordering. Here, we focus on the experimental characterization of the chemical interactions that occur at the interface built between different chemical guiding patterns and the domains of the block copolymers. We have chosen hard X-ray high kinetic energy photoelectron spectroscopy as an exploration technique because it provides information on the electronic structure of buried interfaces. The outcome of the characterization sheds light onto key aspects of directed self-assembly: grafted brush layer, chemical pattern creation and brush/block co-polymer interface. |
| publishDate |
2017 |
| dc.date.none.fl_str_mv |
2 2017-01-01 2017 2017-01-01 |
| dc.type.none.fl_str_mv |
Article http://purl.org/coar/resource_type/c_6501 VoR http://purl.org/coar/version/c_970fb48d4fbd8a85 |
| dc.type.openaire.fl_str_mv |
info:eu-repo/semantics/article |
| format |
article |
| dc.identifier.none.fl_str_mv |
https://ddd.uab.cat/record/186356 https://dx.doi.org/urn:doi:10.3762/bjnano.8.198 |
| url |
https://ddd.uab.cat/record/186356 https://dx.doi.org/urn:doi:10.3762/bjnano.8.198 |
| dc.language.none.fl_str_mv |
Inglés eng |
| language_invalid_str_mv |
Inglés |
| language |
eng |
| dc.relation.none.fl_str_mv |
European Commission https://doi.org/10.13039/501100000780 619793 European Commission https://doi.org/10.13039/501100000780 318804 European Commission https://doi.org/10.13039/501100000780 288879 Ministerio de Economía y Competitividad https://doi.org/10.13039/501100003329 TEC2015-69864-R Ministerio de Economía y Competitividad https://doi.org/10.13039/501100003329 SEV-2013-0295 Ministerio de Economía y Competitividad https://doi.org/10.13039/501100003329 MAT2013-4458-R Ministerio de Educación y Ciencia FPU/13/03746 |
| dc.rights.none.fl_str_mv |
open access http://purl.org/coar/access_right/c_abf2 https://creativecommons.org/licenses/by/4.0/ |
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info:eu-repo/semantics/openAccess |
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open access http://purl.org/coar/access_right/c_abf2 https://creativecommons.org/licenses/by/4.0/ |
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openAccess |
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application/pdf |
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reponame:Dipòsit Digital de Documents de la UAB instname:Universitat Autònoma de Barcelona |
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Dipòsit Digital de Documents de la UAB |
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Dipòsit Digital de Documents de la UAB |
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