Identifying the nature of surface chemical modification for directed self-assembly of block copolymers

In recent years, block copolymer lithography has emerged as a viable alternative technology for advanced lithography. In chemical-epitaxy-directed self-assembly, the interfacial energy between the substrate and each block copolymer domain plays a key role on the final ordering. Here, we focus on the...

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Autores: Evangelio Araujo, Laura, Gramazio, Federico, Lorenzoni, Matteo|||0000-0001-5287-8761, Gorgoi, Michaela, Espinosa, Francisco Miguel, García, Ricardo, Pérez-Murano, Francesc, Fraxedas, Jordi|||0000-0002-2821-4831
Tipo de recurso: artículo
Fecha de publicación:2017
País:España
Institución:Universitat Autònoma de Barcelona
Repositorio:Dipòsit Digital de Documents de la UAB
Idioma:inglés
OAI Identifier:oai:ddd.uab.cat:186356
Acceso en línea:https://ddd.uab.cat/record/186356
https://dx.doi.org/urn:doi:10.3762/bjnano.8.198
Access Level:acceso abierto
Palabra clave:Block copolymer
Chemical guiding pattern
Directed self-assembly
Thin film
X-ray photoemission spectroscopy
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spelling Identifying the nature of surface chemical modification for directed self-assembly of block copolymersEvangelio Araujo, LauraGramazio, FedericoLorenzoni, Matteo|||0000-0001-5287-8761Gorgoi, MichaelaEspinosa, Francisco MiguelGarcía, RicardoPérez-Murano, FrancescFraxedas, Jordi|||0000-0002-2821-4831Block copolymerChemical guiding patternDirected self-assemblyThin filmX-ray photoemission spectroscopyIn recent years, block copolymer lithography has emerged as a viable alternative technology for advanced lithography. In chemical-epitaxy-directed self-assembly, the interfacial energy between the substrate and each block copolymer domain plays a key role on the final ordering. Here, we focus on the experimental characterization of the chemical interactions that occur at the interface built between different chemical guiding patterns and the domains of the block copolymers. We have chosen hard X-ray high kinetic energy photoelectron spectroscopy as an exploration technique because it provides information on the electronic structure of buried interfaces. The outcome of the characterization sheds light onto key aspects of directed self-assembly: grafted brush layer, chemical pattern creation and brush/block co-polymer interface. 22017-01-0120172017-01-01Articlehttp://purl.org/coar/resource_type/c_6501VoRhttp://purl.org/coar/version/c_970fb48d4fbd8a85info:eu-repo/semantics/articleapplication/pdfhttps://ddd.uab.cat/record/186356https://dx.doi.org/urn:doi:10.3762/bjnano.8.198reponame:Dipòsit Digital de Documents de la UABinstname:Universitat Autònoma de BarcelonaInglésengEuropean Commission https://doi.org/10.13039/501100000780 619793European Commission https://doi.org/10.13039/501100000780 318804European Commission https://doi.org/10.13039/501100000780 288879Ministerio de Economía y Competitividad https://doi.org/10.13039/501100003329 TEC2015-69864-RMinisterio de Economía y Competitividad https://doi.org/10.13039/501100003329 SEV-2013-0295Ministerio de Economía y Competitividad https://doi.org/10.13039/501100003329 MAT2013-4458-RMinisterio de Educación y Ciencia FPU/13/03746open accesshttp://purl.org/coar/access_right/c_abf2Aquest document està subjecte a una llicència d'ús Creative Commons. Es permet la reproducció total o parcial, la distribució, la comunicació pública de l'obra i la creació d'obres derivades, fins i tot amb finalitats comercials, sempre i quan es reconegui l'autoria de l'obra original.https://creativecommons.org/licenses/by/4.0/info:eu-repo/semantics/openAccessoai:ddd.uab.cat:1863562026-06-06T12:50:31Z
dc.title.none.fl_str_mv Identifying the nature of surface chemical modification for directed self-assembly of block copolymers
title Identifying the nature of surface chemical modification for directed self-assembly of block copolymers
spellingShingle Identifying the nature of surface chemical modification for directed self-assembly of block copolymers
Evangelio Araujo, Laura
Block copolymer
Chemical guiding pattern
Directed self-assembly
Thin film
X-ray photoemission spectroscopy
title_short Identifying the nature of surface chemical modification for directed self-assembly of block copolymers
title_full Identifying the nature of surface chemical modification for directed self-assembly of block copolymers
title_fullStr Identifying the nature of surface chemical modification for directed self-assembly of block copolymers
title_full_unstemmed Identifying the nature of surface chemical modification for directed self-assembly of block copolymers
title_sort Identifying the nature of surface chemical modification for directed self-assembly of block copolymers
dc.creator.none.fl_str_mv Evangelio Araujo, Laura
Gramazio, Federico
Lorenzoni, Matteo|||0000-0001-5287-8761
Gorgoi, Michaela
Espinosa, Francisco Miguel
García, Ricardo
Pérez-Murano, Francesc
Fraxedas, Jordi|||0000-0002-2821-4831
author Evangelio Araujo, Laura
author_facet Evangelio Araujo, Laura
Gramazio, Federico
Lorenzoni, Matteo|||0000-0001-5287-8761
Gorgoi, Michaela
Espinosa, Francisco Miguel
García, Ricardo
Pérez-Murano, Francesc
Fraxedas, Jordi|||0000-0002-2821-4831
author_role author
author2 Gramazio, Federico
Lorenzoni, Matteo|||0000-0001-5287-8761
Gorgoi, Michaela
Espinosa, Francisco Miguel
García, Ricardo
Pérez-Murano, Francesc
Fraxedas, Jordi|||0000-0002-2821-4831
author2_role author
author
author
author
author
author
author
dc.subject.none.fl_str_mv Block copolymer
Chemical guiding pattern
Directed self-assembly
Thin film
X-ray photoemission spectroscopy
topic Block copolymer
Chemical guiding pattern
Directed self-assembly
Thin film
X-ray photoemission spectroscopy
description In recent years, block copolymer lithography has emerged as a viable alternative technology for advanced lithography. In chemical-epitaxy-directed self-assembly, the interfacial energy between the substrate and each block copolymer domain plays a key role on the final ordering. Here, we focus on the experimental characterization of the chemical interactions that occur at the interface built between different chemical guiding patterns and the domains of the block copolymers. We have chosen hard X-ray high kinetic energy photoelectron spectroscopy as an exploration technique because it provides information on the electronic structure of buried interfaces. The outcome of the characterization sheds light onto key aspects of directed self-assembly: grafted brush layer, chemical pattern creation and brush/block co-polymer interface.
publishDate 2017
dc.date.none.fl_str_mv 2
2017-01-01
2017
2017-01-01
dc.type.none.fl_str_mv Article
http://purl.org/coar/resource_type/c_6501
VoR
http://purl.org/coar/version/c_970fb48d4fbd8a85
dc.type.openaire.fl_str_mv info:eu-repo/semantics/article
format article
dc.identifier.none.fl_str_mv https://ddd.uab.cat/record/186356
https://dx.doi.org/urn:doi:10.3762/bjnano.8.198
url https://ddd.uab.cat/record/186356
https://dx.doi.org/urn:doi:10.3762/bjnano.8.198
dc.language.none.fl_str_mv Inglés
eng
language_invalid_str_mv Inglés
language eng
dc.relation.none.fl_str_mv European Commission https://doi.org/10.13039/501100000780 619793
European Commission https://doi.org/10.13039/501100000780 318804
European Commission https://doi.org/10.13039/501100000780 288879
Ministerio de Economía y Competitividad https://doi.org/10.13039/501100003329 TEC2015-69864-R
Ministerio de Economía y Competitividad https://doi.org/10.13039/501100003329 SEV-2013-0295
Ministerio de Economía y Competitividad https://doi.org/10.13039/501100003329 MAT2013-4458-R
Ministerio de Educación y Ciencia FPU/13/03746
dc.rights.none.fl_str_mv open access
http://purl.org/coar/access_right/c_abf2
https://creativecommons.org/licenses/by/4.0/
dc.rights.openaire.fl_str_mv info:eu-repo/semantics/openAccess
rights_invalid_str_mv open access
http://purl.org/coar/access_right/c_abf2
https://creativecommons.org/licenses/by/4.0/
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.source.none.fl_str_mv reponame:Dipòsit Digital de Documents de la UAB
instname:Universitat Autònoma de Barcelona
instname_str Universitat Autònoma de Barcelona
reponame_str Dipòsit Digital de Documents de la UAB
collection Dipòsit Digital de Documents de la UAB
repository.name.fl_str_mv
repository.mail.fl_str_mv
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