Using electron and ion beams on carbon nanotube-based devices. Effects and considerations for nanofabrication

This work aims to establish the optimal conditions for contacting carbon nanotubes (CNT) using charged beams. First, we study the effect of charged beams on CNT-Field Effect Transistors (CNTFETs) by monitoring the CNTFET electrical characteristics simultaneously to the charged beam irradiation. Then...

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Detalles Bibliográficos
Autores: Rius, Gemma, Llobet, Jordi, Esplandiu, Maria Jose, Solé, Libertat, Borrisé, Xavier, Perez Murano, Francesc X.
Tipo de recurso: artículo
Estado:Versión publicada
Fecha de publicación:2009
País:España
Institución:Consejo Superior de Investigaciones Científicas (CSIC)
Repositorio:DIGITAL.CSIC. Repositorio Institucional del CSIC
OAI Identifier:oai:digital.csic.es:10261/414691
Acceso en línea:http://hdl.handle.net/10261/414691
https://api.elsevier.com/content/abstract/scopus_id/67349122030
Access Level:acceso abierto
Palabra clave:Carbon nanotube
Charged beam
Electron beam-induced-deposition
Irradiation
http://metadata.un.org/sdg/9
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Descripción
Sumario:This work aims to establish the optimal conditions for contacting carbon nanotubes (CNT) using charged beams. First, we study the effect of charged beams on CNT-Field Effect Transistors (CNTFETs) by monitoring the CNTFET electrical characteristics simultaneously to the charged beam irradiation. Then, we establish the conditions for using electron and ion beam-induced-deposition of metal to define contacts to CNT. We demonstrate that by avoiding excessive charging of the CNTFET area during fabrication, devices with good electrical performance can be obtained. © 2008 Elsevier B.V. All rights reserved.