Electron beam lithography for contacting single nanowires on non-flat suspended substrates
A methodology based on the use of Electron Beam Lithography for contacting individual nanowires on top of non-flat micromembranes and microhotplates has been implemented, and the practical details have been exhaustively described. The different fabrication steps have been adapted to the substrate�...
| Autores: | , , , , , , , , , |
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| Formato: | artículo |
| Estado: | Versión aceptada para publicación |
| Fecha de publicación: | 2019 |
| País: | España |
| Recursos: | Universidad de Barcelona |
| Repositorio: | Dipòsit Digital de la UB |
| OAI Identifier: | oai:diposit.ub.edu:2445/127307 |
| Acesso em linha: | https://hdl.handle.net/2445/127307 |
| Access Level: | acceso abierto |
| Palavra-chave: | Detectors de gasos Feixos electrònics Nanoestructures Gas detectors Electron beams Nanostructures |
| Resumo: | A methodology based on the use of Electron Beam Lithography for contacting individual nanowires on top of non-flat micromembranes and microhotplates has been implemented, and the practical details have been exhaustively described. The different fabrication steps have been adapted to the substrate's topology, requiring specific holders and conditions. The methodology is demonstrated on individual SnO2 nanowires, which, after fabrication, have been characterized as functional resistive gas nanosensors towards NH3 and benchmarked against similar devices fabricated using more conventional Dual Beam Focused Ion Beam techniques, demonstrating the superior properties of the here presented methodology, which can be further extended to other non-conventional suspended substrates and nanomaterials. |
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