Enhanced plasma-assisted CO2 methanation on Ru/CeO2 catalysts

Methanation process utilizes CO₂ as a carbon feedstock for synthesizing energy carriers and value-added chemicals. The combination of methanation with plasma-catalysis has emerged as a promising avenue for the electrification of power-to-gas technologies, representing a significant development in th...

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Detalles Bibliográficos
Autores: Musig, Beatrice, Barauna, Jairo, Roy, Abhijit, Arenal, Raul, Gálvez, María Elena, García, Tomás, Murillo, Ramón, Navarro, María Victoria
Tipo de recurso: artículo
Estado:Versión publicada
Fecha de publicación:2025
País:España
Institución:Universidad de Zaragoza
Repositorio:Zaguán. Repositorio Digital de la Universidad de Zaragoza
OAI Identifier:oai:zaguan.unizar.es:163735
Acceso en línea:http://zaguan.unizar.es/record/163735
Access Level:acceso abierto
Descripción
Sumario:Methanation process utilizes CO₂ as a carbon feedstock for synthesizing energy carriers and value-added chemicals. The combination of methanation with plasma-catalysis has emerged as a promising avenue for the electrification of power-to-gas technologies, representing a significant development in the transition to sustainable energy systems. The present study investigates the impact of low 5 % mol Ru loading on CeO2, focusing in the role of the metal in comparison to Ni and the metal-support interactions examined using CeO2 with different structures (nanoneedles, nanopowder) and Ru dispersion within the support. The catalyst Ru/NN with nanoneedles of ceria achieved CO₂ conversion of 70 % and CH₄ selectivity of 99 % at 1CO₂/4H₂, WHSV of 30 L h−1 gcat-1, 12 kgCO2 kgcat-1 h−1 and plasma input power of 8.9 W. The enhanced plasma-catalytic activity of Ru/NN can be attributed to the increased effective H2 dissociation, beneficial physicochemical and electrical properties attributed to the choice of support and optimal metal-support interaction. The lower dielectric capacitance calculated for this catalyst is the result of reduced charge storage and a faster response to the applied electric field. This produces less intense microdischarges and a more stable and uniform plasma environment.