Spatial distribution of vacancy defects in GaP wafers
Cathodoluminescencescanning electron microscopy and positron annihilation techniques have been used to investigate the distribution of defects in GaP wafers. The results show the existence of a gradient of the concentration of vacancy‐type defects along the wafer diameter, which causes inhomogeneity...
| Authors: | , , , |
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| Format: | article |
| Publication Date: | 1988 |
| Country: | España |
| Institution: | Universidad Complutense de Madrid (UCM) |
| Repository: | Docta Complutense |
| Language: | English |
| OAI Identifier: | oai:docta.ucm.es:20.500.14352/59309 |
| Online Access: | https://hdl.handle.net/20.500.14352/59309 |
| Access Level: | Open access |
| Keyword: | 538.9 Physics Applied Física de materiales |
| Summary: | Cathodoluminescencescanning electron microscopy and positron annihilation techniques have been used to investigate the distribution of defects in GaP wafers. The results show the existence of a gradient of the concentration of vacancy‐type defects along the wafer diameter, which causes inhomogeneity in the emission. Dislocation density and vacancy concentration profiles have been compared. |
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