Scanning tunneling spectroscopy of superconducting nitridized aluminum thin films

Nitride-based superconductors represent a family of superconducting thin film materials displaying higher quality than their corresponding bare superconductor when used in devices for applications such as cosmic radiation sensing. In recent times, niobiumbased and titanium-based nitrides were used t...

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Detalles Bibliográficos
Autores: Moreno Flores, José Antonio, García Talavera, Pablo, Torras-Coloma, Alba, Rius, Gemma, Forn-Díaz, P., Herrera Vasco, Edwin, Guillamón Gómez, Isabel, Suderow Rodríguez, Hermann Jesús
Tipo de recurso: artículo
Fecha de publicación:2026
País:España
Institución:Universidad Autónoma de Madrid
Repositorio:Biblos-e Archivo. Repositorio Institucional de la UAM
Idioma:inglés
OAI Identifier:oai:dnet:biblosearchi::d74e0bb36865e2c6f453890ebc118ec2
Acceso en línea:https://hdl.handle.net/10486/756302
https://dx.doi.org/10.1007/s10909-026-03390-y
Access Level:acceso abierto
Palabra clave:Superconductivity
Thin films
Nitridized aluminum
Disordered superconductor
Scanning tunneling microscopy
Density of states
Física
Descripción
Sumario:Nitride-based superconductors represent a family of superconducting thin film materials displaying higher quality than their corresponding bare superconductor when used in devices for applications such as cosmic radiation sensing. In recent times, niobiumbased and titanium-based nitrides were used to improve the quality of superconducting devices in quantum technology applications. Recently, nitridized aluminum (NitrAl) has been found to display higher critical temperatures and enhanced resilience to magnetic fields compared to those of Al, making it a new interesting candidate for superconducting quantum circuit applications. However, the microscopic properties of NitrAl remain highly unexplored. Here, we use scanning tunneling microscope (STM) to measure the superconducting density of states of a thin film sample of nitridized aluminum (NitrAl), with a room temperature resistivity between pure Al and fully insulating aluminum nitride. We show that the in-gap density of states is zero up to about ω = 250 μeV and that there is a distribution of values of the superconducting gap around 0 = 360 μeV, close to the BCS expectation = 1.76kBTc. We also find varying superconducting gap values at the nanometer scale, by approximately 10%, when probing different regions of the sample. These results suggest a gap which is larger than the one of pure Al and is spatially more homogeneous than the superconducting gap values often found in thin films. Our work demonstrates that STM is as a powerful tool to screen materials for quantum devices through the measurement of the spatial dependence of the superconducting density of states