Formation of pyramidal etch hillocks in a Kossel crystal
Surface roughening due to anisotropic etching was studied experimentally and modeled using the Monte Carlo method for a Kossel crystal. Simulations were used to explore a possible formation mechanism for the appearance of etch hillocks in two and three dimensions. Similarities with pyramidal etch...
| Autores: | , , |
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| Tipo de recurso: | artículo |
| Estado: | Versión publicada |
| Fecha de publicación: | 2005 |
| País: | Argentina |
| Institución: | Consejo Nacional de Investigaciones Científicas y Técnicas |
| Repositorio: | CONICET Digital (CONICET) |
| Idioma: | inglés |
| OAI Identifier: | oai:ri.conicet.gov.ar:11336/28057 |
| Acceso en línea: | http://hdl.handle.net/11336/28057 |
| Access Level: | acceso abierto |
| Palabra clave: | Monte Carlo Simulations Scanning Electron Microscopy Etching Surface Structure Morphology Roughness And Topography Silicon Koh |
| Sumario: | Surface roughening due to anisotropic etching was studied experimentally and modeled using the Monte Carlo method for a Kossel crystal. Simulations were used to explore a possible formation mechanism for the appearance of etch hillocks in two and three dimensions. Similarities with pyramidal etch hillocks that are regularly observed in anisotropic etching of Si(100) are discussed. |
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