Morphology of copper deposits obtained by metallic electrodeposition

Electrochemical deposition of copper from copper nitrate aqueous electrolyte on graphite substrate was investigated at current densities between 0.03 mA/cm2 - 1.36 mA/cm2 and in the voltage range of 3 V to 15 V. The surface morphology and elemental composition of the resultant deposit were character...

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Detalles Bibliográficos
Autores: González Mercado, Griselda Verónica, Gonzalez, Carlos Jacinto, Oliva, Marcos Iván, Brunetti, Veronica, Eimer, Griselda Alejandra
Tipo de recurso: artículo
Estado:Versión publicada
Fecha de publicación:2015
País:Argentina
Institución:Consejo Nacional de Investigaciones Científicas y Técnicas
Repositorio:CONICET Digital (CONICET)
Idioma:inglés
OAI Identifier:oai:ri.conicet.gov.ar:11336/43790
Acceso en línea:http://hdl.handle.net/11336/43790
Access Level:acceso abierto
Palabra clave:ELECTRODEPOSITION
EMPA
SUPERFICIAL MORPHOLOGY
COPPER
https://purl.org/becyt/ford/1.4
https://purl.org/becyt/ford/1
Descripción
Sumario:Electrochemical deposition of copper from copper nitrate aqueous electrolyte on graphite substrate was investigated at current densities between 0.03 mA/cm2 - 1.36 mA/cm2 and in the voltage range of 3 V to 15 V. The surface morphology and elemental composition of the resultant deposit were characterized by electron microprobe analysis (EMPA). These images illustrate the influence of current density on the shape of copper electrodeposited on the electrode surface. Rods, polyhedral bodies, pentagonal pyramids, dendritics, spiked spheres or cauliflower-like shapes are observed depending on the electrodeposition conditions.