Microstructural analysis of nanostructured Zn O thin films

We present the experimental results obtained from microstructural analysis of ZnO thin lms with20, 50, and 100 nm in thickness, grown onto the commercial glass substrate by reactive sputtering.We analyze the quantitative information on the size of the crystalline domains, the texture directionof the...

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Detalles Bibliográficos
Autores: Urbina-Yarupetán, M.A., Gonzalez, Juan
Tipo de recurso: artículo
Estado:Versión publicada
Fecha de publicación:2020
País:Perú
Institución:Universidad Nacional Mayor de San Marcos
Repositorio:Revistas - Universidad Nacional Mayor de San Marcos
Idioma:español
OAI Identifier:oai:revistasinvestigacion.unmsm.edu.pe:article/20297
Acceso en línea:https://revistasinvestigacion.unmsm.edu.pe/index.php/fisica/article/view/20297
Access Level:acceso abierto
Palabra clave:reactive magnetron sputtering
ZnO thin film
SEM
XRR
XRD
pulverización catódica reactiva
Capas delgadas de ZnO
MEB
RRX
DRX
Descripción
Sumario:We present the experimental results obtained from microstructural analysis of ZnO thin lms with20, 50, and 100 nm in thickness, grown onto the commercial glass substrate by reactive sputtering.We analyze the quantitative information on the size of the crystalline domains, the texture directionof the nanocolumns, their densities, thicknesses, surface and interface roughness obtained throughcharacterization techniques such as scanning electron microscope (SEM), X-ray reectivity (XRR)and X-ray diraction (DRX).