Optical and electrical properties of lithium doped nickel oxide films deposited by spray pyrolysis onto alumina substrates
Non-doped and lithium doped nickel oxide crystalline films have been prepared onto quartz and crystalline alumina substrates at high substrate temperature (600 degrees C) by the pneumatic spray pyrolysis process using nickel and lithium acetates as source materials. The structure of all the deposite...
| Autores: | , , , , , |
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| Tipo de recurso: | artículo |
| Estado: | Versión publicada |
| Fecha de publicación: | 2010 |
| País: | México |
| Institución: | Universidad Nacional Autónoma de México |
| Repositorio: | Sistema de Información de la Facultad de Ciencias, UNAM |
| OAI Identifier: | oai:repositorio.fciencias.unam.mx:11154/47 |
| Acceso en línea: | http://hdlhandlenet/123456789/173 |
| Access Level: | acceso abierto |
| Palabra clave: | Crystallography Characterization Spray pyrolysis Metal oxides Semiconducting materials |
| Sumario: | Non-doped and lithium doped nickel oxide crystalline films have been prepared onto quartz and crystalline alumina substrates at high substrate temperature (600 degrees C) by the pneumatic spray pyrolysis process using nickel and lithium acetates as source materials. The structure of all the deposited films was the crystalline cubic phase related to NiO, although this crystalline structure was a little bit stressed for the films with higher lithium concentration. The grain size had values between 60 and 70 nm, almost independently of doping concentration. The non-doped and lithium doped films have an energy band gap of the order of 3.6 eV. Hot point probe results show that all deposited films have a p-type semiconductor behavior. From current-voltage measurements it was observed that the electrical resistivity decreases as the lithium concentration increases, indicating that the doping action of lithium is carried out. The electrical resistivity changed from 10(6) Omega cm for the non-doped films up to 10(2) Omega cm for the films prepared with the highest doping concentration. (C) 2010 Elsevier B.V. All rights reserved. |
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