Electrodeposition of Nickel Particles and their Characterization
Electrodeposition of nickel particles on ITO substrates is achieved by current pulse reduction. A comparison between potential pulse and current pulse experiments presents differences in particle size and particle size distribution. The latter shows smaller particle size dispersion than what is foun...
| Autores: | , , |
|---|---|
| Formato: | artículo |
| Estado: | Versión publicada |
| Fecha de publicación: | 2009 |
| País: | México |
| Recursos: | Instituto Tecnológico y de Estudios Superiores de Monterrey |
| Repositorio: | Redalyc-ITESM |
| OAI Identifier: | oai:redalyc.org:47512075002 |
| Acesso em linha: | https://www.redalyc.org/articulo.oa?id=47512075002 |
| Access Level: | acceso abierto |
| Palavra-chave: | Química Microscopy Atomic Force Electrodeposition magnetic nanoparticles Magnetic Force Microscopy |
| Resumo: | Electrodeposition of nickel particles on ITO substrates is achieved by current pulse reduction. A comparison between potential pulse and current pulse experiments presents differences in particle size and particle size distribution. The latter shows smaller particle size dispersion than what is found with potential pulses. Characterization of the particles carried out by Atomic Force Microscopy shows particles with average sizes between 100 to 300 nm. Magnetic characterization by Magnetic Force Microscopy and SQUID shows that particles of ~300 nm were ferromagnetic with a coercive field of 200 Oe and a saturation magnetization of 40 × 10-6 emu at 300 K. |
|---|