Synthesis and characterization of hafnium oxide films for thermo and photoluminescence applications
Hafnium oxide (HfO2) films were deposited by the ultrasonic spray pyrolysis process. The films were synthesized from hafnium chloride as raw material in deionized water as solvent and were deposited on corning glass substrates at temperatures from 300 to 600 1C. For substrate temperatures lower than...
| Autores: | , , , , , , , |
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| Formato: | artículo |
| Estado: | Versión publicada |
| Fecha de publicación: | 2010 |
| País: | México |
| Recursos: | Instituto Politécnico Nacional |
| Repositorio: | Repositorio Digital del IPN |
| OAI Identifier: | oai:www.repositoriodigital.ipn.mx:123456789/11022 |
| Acesso em linha: | http://hdl.handle.net/123456789/534 http://www.repositoriodigital.ipn.mx/handle/123456789/11022 |
| Access Level: | acceso abierto |
| Palavra-chave: | Hafnium oxide films spray pyrolysis UV radiation dosimetry |
| Resumo: | Hafnium oxide (HfO2) films were deposited by the ultrasonic spray pyrolysis process. The films were synthesized from hafnium chloride as raw material in deionized water as solvent and were deposited on corning glass substrates at temperatures from 300 to 600 1C. For substrate temperatures lower than 400 1C the deposited films were amorphous, while for substrate temperatures higher than 450 1C, the monoclinic phase of HfO2 appeared. Scanning electron microscopy showed that the film’s surface resulted rough with semi-spherical promontories. The films showed a chemical composition close to HfO2, with an Hf/O ratio of about 0.5. UV radiation was used in order to achieve the thermoluminescent characterization of the films; the 240nm wavelength induced the best response. In addition, preliminary photoluminescence spectra, as a function of the deposition temperatures, are shown. |
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