Atomistic modeling of high energy irradiation in semiconductors

This project aims to develop atomistic models based on physical mechanisms that are predictive and computationally efficient for simulating high-energy irradiation processes in semiconductors. In particular, irradiation with very high-energy neutrons and protons (MeV-GeV) is an inevitable process in...

ver descrição completa

Detalhes bibliográficos
Autores: López Martín, Pedro, Pelaz Montes, María Lourdes, Marqués Cuesta, Luis Alberto, Aboy Cebrián, María, Santos Tejido, Iván, Martín Encinar, Luis
Formato: conjunto de datos
Estado:Versión actualizada desde la publicación
Fecha de publicación:2026
País:España
Recursos:Universidad de Valladolid
Repositorio:UVaDOC. Repositorio Documental de la Universidad de Valladolid
OAI Identifier:oai:uvadoc.uva.es:10324/81351
Acesso em linha:https://doi.org/10.71569/48xr-cg45
https://uvadoc.uva.es/handle/10324/81351
Access Level:acceso abierto
Palavra-chave:high energy irradiation
atomistic simulation
modeling
defects
semiconductor
acceptor removal
dopants
2211.25 Semiconductores
3307.91 Microelectrónica. Tecnología del Silicio
Descrição
Resumo:This project aims to develop atomistic models based on physical mechanisms that are predictive and computationally efficient for simulating high-energy irradiation processes in semiconductors. In particular, irradiation with very high-energy neutrons and protons (MeV-GeV) is an inevitable process in devices operating in highly radioactive environments (radiation sensors, nuclear facilities, medical radiological equipment, etc.), causing a loss of performance and a reduction in their lifespan. We have established a multi-scale atomistic simulation methodology combining the Geant4 – BCA – kMC techniques, which allows us to obtain the spectrum of recoils produced by a given irradiation (particle type and energy), simulate their interaction with the semiconductor, and their effect on the activation of dopants. This Dataset includes the spectrum of PKAs resulting from neutron and proton irradiation in Si obtained with Geant4, the analysis of defects produced by low energy Si recoils as simulated by MD and BCA techniques, and the simulation with the kMC code DADOS of dopant deactivation (acceptor removal process) in p-type Si sensors induced by neutron an proton irradiation.