Neutral organic radical formation by chemisorption on metal surfaces
Organic radical monolayers (r-MLs) bonded to metal surfaces are potential materials for the development of molecular (spin)electronics. Typically, stable radicals bearing surface anchoring groups are used to generate r-MLs. Following a recent theoretical proposal based on a model system, we report t...
| Autores: | , , , , , , , , |
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| Tipo de recurso: | artículo |
| Fecha de publicación: | 2020 |
| País: | España |
| Institución: | Universitat Autònoma de Barcelona |
| Repositorio: | Dipòsit Digital de Documents de la UAB |
| Idioma: | inglés |
| OAI Identifier: | oai:ddd.uab.cat:232125 |
| Acceso en línea: | https://ddd.uab.cat/record/232125 https://dx.doi.org/urn:doi:10.1021/acs.jpclett.0c00269 |
| Access Level: | acceso abierto |
| Palabra clave: | Angle resolved photoelectron spectroscopy Bearing surfaces Electronic structure calculations Experimental realizations Organic radicals Potential materials Singly occupied molecular orbitals Surface reactivity |
| Sumario: | Organic radical monolayers (r-MLs) bonded to metal surfaces are potential materials for the development of molecular (spin)electronics. Typically, stable radicals bearing surface anchoring groups are used to generate r-MLs. Following a recent theoretical proposal based on a model system, we report the first experimental realization of a metal surface-induced r-ML, where a rationally chosen closed-shell precursor 3,5-dichloro-4-[bis(2,4,6-trichlorophenyl)methylen]cyclohexa-2,5-dien-1-one (1) transforms into a stable neutral open-shell species () via chemisorption on the Ag(111) surface. X-ray photoelectron spectroscopy reveals that the. |
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