The effect of temperature and excitation energy on Raman scattering in bulk HfS 2

Raman scattering (RS) in bulk hafnium disulfide ( HfS2 ) is investigated as a function of temperature (5 K - 350 K) with polarization resolution and excitation of several laser energies. An unexpected temperature dependence of the energies of the main Raman-active (A 1g and Eg) modes with the temper...

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Detalles Bibliográficos
Autores: Antoniazzi, Igor, Zawadzka, N., Grzeszczyk, M., Woźniak, T., Ibáñez Insa, Jordi, Muhammad, Z., Zhao, W., Molas, M. R., Babiński, A.
Tipo de recurso: artículo
Estado:Versión publicada
Fecha de publicación:2023
País:España
Institución:Consejo Superior de Investigaciones Científicas (CSIC)
Repositorio:DIGITAL.CSIC. Repositorio Institucional del CSIC
OAI Identifier:oai:digital.csic.es:10261/349518
Acceso en línea:http://hdl.handle.net/10261/349518
Access Level:acceso abierto
Palabra clave:Excitation energy dependence
Phase transition
Polarization resolved Raman scattering
Raman scattering
Temperature dependence
Transition metal dichalcogenides
Descripción
Sumario:Raman scattering (RS) in bulk hafnium disulfide ( HfS2 ) is investigated as a function of temperature (5 K - 350 K) with polarization resolution and excitation of several laser energies. An unexpected temperature dependence of the energies of the main Raman-active (A 1g and Eg) modes with the temperature-induced blueshift in the low-temperature limit is observed. The low-temperature quenching of a mode ω 1 (134 cm-1) and the emergence of a new mode at approx. 184 cm-1, labeled Z, is reported. The optical anisotropy of the RS in HfS2 is also reported, which is highly susceptible to the excitation energy. The apparent quenching of the A 1g mode at T = 5 K and of the Eg mode at T = 300 K in the RS spectrum excited with 3.06 eV excitation is also observed. We discuss the results in the context of possible resonant character of light-phonon interactions. Analyzed is also a possible effect of the iodine molecules intercalated in the van der Waals gaps between neighboring HfS2 layers, which inevitably result from the growth procedure.