Diffusional Behavior of New Insulating Gas Mixtures as Alternatives to the SF6-Use in Medium Voltage Switchgear
Regarding the use of SF6 in medium voltage switchgear (MVS), a review of alternatives was encouraged by the European Parliament in Regulation No 517/2014. This is aimed at a new regulatory change, that is expected soon, which will include its prohibition, similar to what has happened with other fluo...
| Autores: | , , , , , , , , |
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| Tipo de recurso: | artículo |
| Fecha de publicación: | 2022 |
| País: | España |
| Institución: | Universidad del País Vasco |
| Repositorio: | Addi. Archivo Digital para la Docencia y la Investigación |
| OAI Identifier: | oai:addi.ehu.eus:10810/55451 |
| Acceso en línea: | http://hdl.handle.net/10810/55451 |
| Access Level: | acceso abierto |
| Palabra clave: | medium voltage switchgear SF6 alternatives UV-Vis spectroscopy gas mixing modeling multicomponent diffusion analysis |
| Sumario: | Regarding the use of SF6 in medium voltage switchgear (MVS), a review of alternatives was encouraged by the European Parliament in Regulation No 517/2014. This is aimed at a new regulatory change, that is expected soon, which will include its prohibition, similar to what has happened with other fluorinated greenhouse gases in other fields, like refrigeration. Therefore, there is an urgent need to study the physical and chemical properties of alternative gas mixtures to determine if they are suitable to replace SF6. In this context, this work addresses the difusional analysis of new gases. Binary and ternary mixtures made of 1,3,3,3-tetrafluoropropene (C3F4H2) and heptafluoroisopropyl trifluoromethyl ketone (C5F10O), using dry air as a carrier gas, were studied. The mixtures were analyzed using original equipment, composed of UV-Vis spectroscopy technology in a sealed gas chamber, which is similar to MVS. Consequently, an experimental equipment that monitors the concentration of a gas mixture online and a model that predicts the mixing process were designed and tested. The concentration profiles were obtained concerning both the time and position in the gas chamber, and the diffusional and convectional parameters were numerically calculated and optimized in an algorithm created in Scilab. |
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