Atomic structure of the nanocrystalline Si particles appearing in nanostructured Si thin films produced in low-temperature radiofrequency plasmas

Nanostructured Si thin films, also referred as polymorphous, were grown by plasma-enhanced chemical vapor deposition. The term "polymorphous" is used to define silicon material that consists of a two-phase mixture of amorphous and ordered Si. The plasma conditions were set to obtain Si thi...

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Detalhes bibliográficos
Autores: Viera Mármol, Gregorio, Mikikian, M., Bertrán Serra, Enric, Roca i Cabarrocas, P. (Pere), Boufendi, L.
Formato: artículo
Estado:Versión publicada
Fecha de publicación:2002
País:España
Recursos:Varias* (Consorci de Biblioteques Universitáries de Catalunya, Centre de Serveis Científics i Acadèmics de Catalunya)
Repositorio:Recercat. Dipósit de la Recerca de Catalunya
OAI Identifier:oai:recercat.cat:2445/24794
Acesso em linha:https://hdl.handle.net/2445/24794
Access Level:acceso abierto
Palavra-chave:Estructura atòmica
Nanocristalls
Silici
Atomic structure
Nanocrystals
Silicon
Thin films
Plasma (Ionized gases)
Pel·lícules fines
Plasma (Gasos ionitzats)
Descrição
Resumo:Nanostructured Si thin films, also referred as polymorphous, were grown by plasma-enhanced chemical vapor deposition. The term "polymorphous" is used to define silicon material that consists of a two-phase mixture of amorphous and ordered Si. The plasma conditions were set to obtain Si thin films from the simultaneous deposition of radical and ordered nanoparticles. Here, a careful analysis by electron transmission microscopy and electron diffraction is reported with the aim to clarify the specific atomic structure of the nanocrystalline particles embedded in the films. Whatever the plasma conditions, the electron diffraction images always revealed the existence of a well-defined crystalline structure different from the diamondlike structure of Si. The formation of nanocrystallinelike films at low temperature is discussed. A Si face-cubic-centered structure is demonstrated here in nanocrystalline particles produced in low-pressure silane plasma at room temperature.