Controlling mid-infrared plasmons in graphene nanostructures through post-fabrication chemical doping

Engineering the doping level in graphene nanostructures to yield controlled and intense localized surface plasmon resonance (LSPR) is fundamental for their practical use in applications such as molecular sensing for point of care or environmental monitoring. In this work, we experimentally study how...

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Detalles Bibliográficos
Autores: Paulillo, Bruno, Bareza, Nestor, Jr.|||0000-0002-0562-650X, Pruneri, Valerio
Tipo de recurso: artículo
Fecha de publicación:2021
País:España
Institución:Universitat Politècnica de Catalunya (UPC)
Repositorio:UPCommons. Portal del coneixement obert de la UPC
Idioma:inglés
OAI Identifier:oai:upcommons.upc.edu:2117/368817
Acceso en línea:https://hdl.handle.net/2117/368817
https://dx.doi.org/10.1088/2515-7647/abf943
Access Level:acceso abierto
Palabra clave:graphene
Graphene
grafè
Àrees temàtiques de la UPC::Física
Descripción
Sumario:Engineering the doping level in graphene nanostructures to yield controlled and intense localized surface plasmon resonance (LSPR) is fundamental for their practical use in applications such as molecular sensing for point of care or environmental monitoring. In this work, we experimentally study how chemical doping of graphene nanostructures using ethylene amines affects their mid-infrared plasmonic response following the induced change in electrical transport properties. Combining post-fabrication silanization and amine doping allows to prepare the surface to support a strong LSPR response at zero bias. These findings pave the way to design highly doped graphene LSPR surfaces for infrared sensors operating in real environments.