Hydrogen desorption in SiGe films
A model to explain the hydrogen desorption kinetics in SiGe alloys is presented. This is an extension of a previous desorption model of hydrogen from Si, that considers the presence of three dimer types in the surface in which hydrogen atoms tend to pair before the desorptionreaction.Surfacediffusio...
| Autores: | , , , |
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| Tipo de recurso: | artículo |
| Fecha de publicación: | 1997 |
| País: | España |
| Institución: | Universitat Autònoma de Barcelona |
| Repositorio: | Dipòsit Digital de Documents de la UAB |
| Idioma: | inglés |
| OAI Identifier: | oai:ddd.uab.cat:116298 |
| Acceso en línea: | https://ddd.uab.cat/record/116298 https://dx.doi.org/urn:doi:10.1063/1.118429 |
| Access Level: | acceso abierto |
| Palabra clave: | Desorption Diffusion Atom reactions Atom surface interactions Chemical interdiffusion Hydrogen reactions Reaction kinetics modeling Surface reactions |
| Sumario: | A model to explain the hydrogen desorption kinetics in SiGe alloys is presented. This is an extension of a previous desorption model of hydrogen from Si, that considers the presence of three dimer types in the surface in which hydrogen atoms tend to pair before the desorptionreaction.Surfacediffusion is included in the model. The comparison with experimental results shows that desorption is a diffusion limited process. |
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