Exploring the benefits of depositing hard TiN thin films by non-reactive magnetron sputtering
The aim of this paper is to compare the mechanical and tribological properties of TiN coatings prepared in a conventional magnetron sputtering chamber according to two different routes: the usual reactive sputtering of a Ti target in an Ar/N2 atmosphere vs. the comparatively more simple sputtering o...
| Autores: | , , , |
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| Tipo de documento: | artigo |
| Estado: | Versión aceptada para publicación |
| Data de publicação: | 2013 |
| País: | España |
| Recursos: | Consejo Superior de Investigaciones Científicas (CSIC) |
| Repositório: | DIGITAL.CSIC. Repositorio Institucional del CSIC |
| OAI Identifier: | oai:digital.csic.es:10261/114595 |
| Acesso em linha: | http://hdl.handle.net/10261/114595 |
| Access Level: | Acceso aberto |
| Palavra-chave: | TiN Target Magnetron sputtering XRD Stress Hardness |
| Resumo: | The aim of this paper is to compare the mechanical and tribological properties of TiN coatings prepared in a conventional magnetron sputtering chamber according to two different routes: the usual reactive sputtering of a Ti target in an Ar/N2 atmosphere vs. the comparatively more simple sputtering of a TiN target in a pure Ar atmosphere. Improved properties in term of hardness and wear rates were obtained for films prepared by non-reactive sputtering route, due to the lower presence of oxynitride species and larger crystalline domain size. Additionally, a significant hardness enhancement (up to 45 GPa) is obtained when a −100 V d.c. bias is applied during growth. This behaviour is explained by non-columnar growth and small grain size induced by effective ion bombarding. These results demonstrate that non-reactive sputtering of TiN target appears a simple and efficient method to prepare hard wear-resistant TiN films. |
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