Low oxidation conditions in pulsed laser deposition enhance polarization without degradation of endurance and retention in Hf0.5Zr0.5O2 films
Interplay between oxygen vacancies and the stabilization of the ferroelectric orthorhombic phase in doped HfO2, as well as the resulting impact on endurance and retention, is far from being well understood. In Hf0.5Zr0.5O2 (HZO) thin films, it is commonly found that high polarization occurs usually...
| Autores: | , , , |
|---|---|
| Tipo de recurso: | artículo |
| Estado: | Versión publicada |
| Fecha de publicación: | 2024 |
| País: | España |
| Institución: | Consejo Superior de Investigaciones Científicas (CSIC) |
| Repositorio: | DIGITAL.CSIC. Repositorio Institucional del CSIC |
| OAI Identifier: | oai:digital.csic.es:10261/362469 |
| Acceso en línea: | http://hdl.handle.net/10261/362469 https://api.elsevier.com/content/abstract/scopus_id/85191783607 |
| Access Level: | acceso abierto |
| Palabra clave: | Crystallographic defects Epitaxy Ferroelectric materials Pulsed laser deposition Magnetic hysteresis Magnetic materials Thin films |
| Sumario: | Interplay between oxygen vacancies and the stabilization of the ferroelectric orthorhombic phase in doped HfO2, as well as the resulting impact on endurance and retention, is far from being well understood. In Hf0.5Zr0.5O2 (HZO) thin films, it is commonly found that high polarization occurs usually at the the expense of robustness upon cycling due to the polarization-endurance dilemma. It has been reported that HZO thin films grown by pulsed laser deposition under the mixed Ar and O2 atmosphere exhibit a high polarization. Here, we show that this strategy enables functional properties tuning, allowing to obtain HZO films with high polarization at low oxidation conditions without degradation of endurance and retention. |
|---|