Enhanced compositional sensitivity in atomic force microscopy by the excitation of the first two flexural modes
The authors demonstrate that the compositional sensitivity of an atomic force microscope is enhanced by the simultaneous excitation of its first two flexural eigenmodes. The coupling of those modes by the nonlinear probe-surface interactions enables to map compositional changes in several conjugated...
| Autores: | , , , |
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| Tipo de recurso: | artículo |
| Fecha de publicación: | 2006 |
| País: | España |
| Institución: | Consejo Superior de Investigaciones Científicas (CSIC) |
| Repositorio: | DIGITAL.CSIC. Repositorio Institucional del CSIC |
| OAI Identifier: | oai:digital.csic.es:10261/17931 |
| Acceso en línea: | http://hdl.handle.net/10261/17931 |
| Access Level: | acceso abierto |
| Palabra clave: | Atomic force microscopy Silicon Elemental semiconductors Vibrational modes Surface topography |
| Sumario: | The authors demonstrate that the compositional sensitivity of an atomic force microscope is enhanced by the simultaneous excitation of its first two flexural eigenmodes. The coupling of those modes by the nonlinear probe-surface interactions enables to map compositional changes in several conjugated molecular materials with a phase shift sensitivity that is about one order of magnitude higher than the one achieved in amplitude modulation atomic force microscopy. |
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