Nanoscale capacitance microscopy of thin dielectric films

We present an analytical model to interpret nanoscale capacitance microscopy measurements on thin dielectric films. The model displays a logarithmic dependence on the tip-sample distance and on the film thickness-dielectric constant ratio and shows an excellent agreement with finite-element numerica...

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Detalhes bibliográficos
Autores: Gomila Lluch, Gabriel, Toset Gilabert, Jorge, Fumagalli, Laura, 1959-
Formato: artículo
Estado:Versión publicada
Fecha de publicación:2008
País:España
Recursos:Universidad de Barcelona
Repositorio:Dipòsit Digital de la UB
OAI Identifier:oai:diposit.ub.edu:2445/25086
Acesso em linha:https://hdl.handle.net/2445/25086
Access Level:acceso abierto
Palavra-chave:Dielèctrics
Nanotecnologia
Dielectrics
Nanotechnology
Descrição
Resumo:We present an analytical model to interpret nanoscale capacitance microscopy measurements on thin dielectric films. The model displays a logarithmic dependence on the tip-sample distance and on the film thickness-dielectric constant ratio and shows an excellent agreement with finite-element numerical simulations and experimental results on a broad range of values. Based on these results, we discuss the capabilities of nanoscale capacitance microscopy for the quantitative extraction of the dielectric constant and the thickness of thin dielectric films at the nanoscale.