Influence of boehmite intermediate layer as covalent linker on synthesis of LTA zeolite coatings
[EN]: The incorporation of nanostructured materials, such as LTA-type zeolite on the silicon wafers, opens a very interesting door to the use of these materials within silicon based microfabrication technologies. This work studies the deposition and intergrowth of defect-free LTA-type zeolite layer...
| Autores: | , , |
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| Tipo de documento: | artigo |
| Estado: | Versão publicada |
| Data de publicação: | 2021 |
| País: | España |
| Recursos: | Consejo Superior de Investigaciones Científicas (CSIC) |
| Repositório: | DIGITAL.CSIC. Repositorio Institucional del CSIC |
| OAI Identifier: | oai:digital.csic.es:10261/265904 |
| Acesso em linha: | http://hdl.handle.net/10261/265904 https://doi.org/10.17533/udea.redin.20200693 |
| Access Level: | Acceso aberto |
| Palavra-chave: | Coating Silicon support Zeolite Boehmite Hydrothermal synthesis |
| Resumo: | [EN]: The incorporation of nanostructured materials, such as LTA-type zeolite on the silicon wafers, opens a very interesting door to the use of these materials within silicon based microfabrication technologies. This work studies the deposition and intergrowth of defect-free LTA-type zeolite layer onto 3-inch Silicon wafers with a layer of SiO2 subjected to pretreatment. The main disadvantage associated with zeolite layer synthesis are crack the formation of cracks and difficulty of obtaining a uniform layer. By modifying the supports with boehmite, a substantial improvement was observed in terms of layer continuity and crystal intergrowth in comparrison to coatings prepared on cationic polymer, poly (diallyldimethylammonium chloride). An LTA- type zeolite layer was synthesized in a range of 350 to 1300 nm via hydrothermal ex-situ method at 363 K for 12 h. Tetramethylammonium hydroxide (TMAOH) was used as a template, and aluminum isopropoxide and colloidal silica were used as Al and Si sources, respectively. |
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