Optical and microstructural properties of MgF2 UV coatings grown by ion beam sputtering process

The optical, mechanical, and microstructural properties of MgF2 single layers grown by ion beam sputtering have been investigated by spectrophotometric measurements, film stress characterization, x-ray photoelectron spectroscopy (XPS), x-ray diffraction, and transmission electron microscopy. The dep...

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Autores: Quesnel, Etienne, Dumas, L., Jacob, D., Peiró Martínez, Francisca
Tipo de recurso: artículo
Estado:Versión publicada
Fecha de publicación:2000
País:España
Institución:Universidad de Barcelona
Repositorio:Dipòsit Digital de la UB
OAI Identifier:oai:diposit.ub.edu:2445/25050
Acceso en línea:https://hdl.handle.net/2445/25050
Access Level:acceso abierto
Palabra clave:Propietats òptiques
Revestiments
Microscòpia electrònica
Fluorurs
Pel·lícules fines
Làsers
Optical properties
Coatings
Electron microscopy
Fluorides
Thin films
Lasers
id ES_70ea6de5eb2abd6bc540be4db8b798fb
oai_identifier_str oai:diposit.ub.edu:2445/25050
network_acronym_str ES
network_name_str España
repository_id_str
spelling Optical and microstructural properties of MgF2 UV coatings grown by ion beam sputtering processQuesnel, EtienneDumas, L.Jacob, D.Peiró Martínez, FranciscaPropietats òptiquesRevestimentsMicroscòpia electrònicaFluorursPel·lícules finesLàsersOptical propertiesCoatingsElectron microscopyFluoridesThin filmsLasersThe optical, mechanical, and microstructural properties of MgF2 single layers grown by ion beam sputtering have been investigated by spectrophotometric measurements, film stress characterization, x-ray photoelectron spectroscopy (XPS), x-ray diffraction, and transmission electron microscopy. The deposition conditions, using fluorine reactive gas or not, have been found to greatly influence the optical absorption and the stress of the films as well as their microstructure. The layers grown with fluorine compensation exhibit a regular columnar microstructure and an UV-optical absorption which can be very low, either as deposited or after thermal annealings at very low temperatures. On the contrary, layers grown without fluorine compensation exhibit a less regular microstructure and a high ultraviolet absorption which is particularly hard to cure. On the basis of calculations, it is shown that F centers are responsible for this absorption, whereas all the films were found to be stoichiometric, in the limit of the XPS sensitivity. On the basis of external data taken from literature, our experimental curves are analyzed, so we propose possible diffusion mechanisms which could explain the behaviors of the coatings.American Institute of Physics2000info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionapplication/pdfhttps://hdl.handle.net/2445/25050Articles publicats en revistes (Enginyeria Electrònica i Biomèdica)reponame:Dipòsit Digital de la UBinstname:Universidad de BarcelonaInglésReproducció del document publicat a: http://dx.doi.org/10.1116/1.1290374Journal of Vacuum Science Technology A-Vacuum Surfaces and Films, 2000, vol. 18, p. 2869-2876http://dx.doi.org/10.1116/1.1290374(c) American Institute of Physics, 2000info:eu-repo/semantics/openAccessoai:diposit.ub.edu:2445/250502026-05-27T06:46:51Z
dc.title.none.fl_str_mv Optical and microstructural properties of MgF2 UV coatings grown by ion beam sputtering process
title Optical and microstructural properties of MgF2 UV coatings grown by ion beam sputtering process
spellingShingle Optical and microstructural properties of MgF2 UV coatings grown by ion beam sputtering process
Quesnel, Etienne
Propietats òptiques
Revestiments
Microscòpia electrònica
Fluorurs
Pel·lícules fines
Làsers
Optical properties
Coatings
Electron microscopy
Fluorides
Thin films
Lasers
title_short Optical and microstructural properties of MgF2 UV coatings grown by ion beam sputtering process
title_full Optical and microstructural properties of MgF2 UV coatings grown by ion beam sputtering process
title_fullStr Optical and microstructural properties of MgF2 UV coatings grown by ion beam sputtering process
title_full_unstemmed Optical and microstructural properties of MgF2 UV coatings grown by ion beam sputtering process
title_sort Optical and microstructural properties of MgF2 UV coatings grown by ion beam sputtering process
dc.creator.none.fl_str_mv Quesnel, Etienne
Dumas, L.
Jacob, D.
Peiró Martínez, Francisca
author Quesnel, Etienne
author_facet Quesnel, Etienne
Dumas, L.
Jacob, D.
Peiró Martínez, Francisca
author_role author
author2 Dumas, L.
Jacob, D.
Peiró Martínez, Francisca
author2_role author
author
author
dc.subject.none.fl_str_mv Propietats òptiques
Revestiments
Microscòpia electrònica
Fluorurs
Pel·lícules fines
Làsers
Optical properties
Coatings
Electron microscopy
Fluorides
Thin films
Lasers
topic Propietats òptiques
Revestiments
Microscòpia electrònica
Fluorurs
Pel·lícules fines
Làsers
Optical properties
Coatings
Electron microscopy
Fluorides
Thin films
Lasers
description The optical, mechanical, and microstructural properties of MgF2 single layers grown by ion beam sputtering have been investigated by spectrophotometric measurements, film stress characterization, x-ray photoelectron spectroscopy (XPS), x-ray diffraction, and transmission electron microscopy. The deposition conditions, using fluorine reactive gas or not, have been found to greatly influence the optical absorption and the stress of the films as well as their microstructure. The layers grown with fluorine compensation exhibit a regular columnar microstructure and an UV-optical absorption which can be very low, either as deposited or after thermal annealings at very low temperatures. On the contrary, layers grown without fluorine compensation exhibit a less regular microstructure and a high ultraviolet absorption which is particularly hard to cure. On the basis of calculations, it is shown that F centers are responsible for this absorption, whereas all the films were found to be stoichiometric, in the limit of the XPS sensitivity. On the basis of external data taken from literature, our experimental curves are analyzed, so we propose possible diffusion mechanisms which could explain the behaviors of the coatings.
publishDate 2000
dc.date.none.fl_str_mv 2000
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv https://hdl.handle.net/2445/25050
url https://hdl.handle.net/2445/25050
dc.language.none.fl_str_mv Inglés
language_invalid_str_mv Inglés
dc.relation.none.fl_str_mv Reproducció del document publicat a: http://dx.doi.org/10.1116/1.1290374
Journal of Vacuum Science Technology A-Vacuum Surfaces and Films, 2000, vol. 18, p. 2869-2876
http://dx.doi.org/10.1116/1.1290374
dc.rights.none.fl_str_mv (c) American Institute of Physics, 2000
info:eu-repo/semantics/openAccess
rights_invalid_str_mv (c) American Institute of Physics, 2000
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.publisher.none.fl_str_mv American Institute of Physics
publisher.none.fl_str_mv American Institute of Physics
dc.source.none.fl_str_mv Articles publicats en revistes (Enginyeria Electrònica i Biomèdica)
reponame:Dipòsit Digital de la UB
instname:Universidad de Barcelona
instname_str Universidad de Barcelona
reponame_str Dipòsit Digital de la UB
collection Dipòsit Digital de la UB
repository.name.fl_str_mv
repository.mail.fl_str_mv
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score 15.301603

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