Cita APA

González, M. B., Rafí, J. M., Beldarrain, O., Zabala, M., & Campabadal, F. (2013). Charge trapping analysis of Al<inf>2</inf>O<inf>3</inf> films deposited by atomic layer deposition using H<inf>2</inf>O or O<inf>3</inf> as oxidant.

Citación estilo Chicago

González, Mireia Bargalló, Joan Marc Rafí, Oihane Beldarrain, Miguel Zabala, y Francesca Campabadal. Charge Trapping Analysis of Al<inf>2</inf>O<inf>3</inf> Films Deposited By Atomic Layer Deposition Using H<inf>2</inf>O or O<inf>3</inf> As Oxidant. 2013.

Cita MLA

González, Mireia Bargalló, et al. Charge Trapping Analysis of Al<inf>2</inf>O<inf>3</inf> Films Deposited By Atomic Layer Deposition Using H<inf>2</inf>O or O<inf>3</inf> As Oxidant. 2013.