Extreme Ultraviolet Fractional Orbital Angular Momentum Beams from High Harmonic Generation

We investigate theoretically the generation of extreme-ultraviolet (EUV) beams carrying fractional orbital angular momentum. To this end, we drive high-order harmonic generation with infrared conical refraction (CR) beams. We show that the high-order harmonic beams emitted in the EUV/soft x-ray regi...

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Detalles Bibliográficos
Autores: Turpin Avilés, Alejandro|||0000-0001-7877-782X, Rego, Laura|||0000-0002-7214-7402, Picón, Antonio|||0000-0002-6142-3440, San Román, Julio, Hernández-García, Carlos|||0000-0002-6153-2647
Tipo de recurso: artículo
Fecha de publicación:2017
País:España
Institución:Universitat Autònoma de Barcelona
Repositorio:Dipòsit Digital de Documents de la UAB
Idioma:inglés
OAI Identifier:oai:ddd.uab.cat:253828
Acceso en línea:https://ddd.uab.cat/record/253828
https://dx.doi.org/urn:doi:10.1038/srep43888
Access Level:acceso abierto
Palabra clave:Atomic and molecular interactions with photons
Attosecond science
High-harmonic generation
Nonlinear optics
X-rays
Descripción
Sumario:We investigate theoretically the generation of extreme-ultraviolet (EUV) beams carrying fractional orbital angular momentum. To this end, we drive high-order harmonic generation with infrared conical refraction (CR) beams. We show that the high-order harmonic beams emitted in the EUV/soft x-ray regime preserve the characteristic signatures of the driving beam, namely ringlike transverse intensity profile and CR-like polarization distribution. As a result, through orbital and spin angular momentum conservation, harmonic beams are emitted with fractional orbital angular momentum, and they can be synthesized into structured attosecond helical beams -or "structured attosecond light springs"- with rotating linear polarization along the azimuth. Our proposal overcomes the state of the art limitations for the generation of light beams far from the visible domain carrying non-integer orbital angular momentum and could be applied in fields such as diffraction imaging, EUV lithography, particle trapping, and super-resolution imaging.