Plasmas and Acoustic Waves to Pattern the Nanostructure and Chemistry of Thin Films
In this work, piezoelectric AWs and plasmas have been brought together during the growth of a thin film as a novel methodology of plasma-assisted thin film structuration. The ensuing effects have been investigated on a model system where SiO2 and SiOx (x<2) thin films have been deposited by magne...
| Autores: | , , , , , , , , , |
|---|---|
| Tipo de recurso: | artículo |
| Estado: | Versión publicada |
| Fecha de publicación: | 2023 |
| País: | España |
| Institución: | Universidad de Sevilla (US) |
| Repositorio: | idUS. Depósito de Investigación de la Universidad de Sevilla |
| OAI Identifier: | oai:idus.us.es:11441/158817 |
| Acceso en línea: | https://hdl.handle.net/11441/158817 https://doi.org/10.1016/j.actamat.2023.119058 |
| Access Level: | acceso abierto |
| Palabra clave: | Magnetron sputtering at oblique angle Nanostructure and chemistry Plasma-acoustic waves interaction SiO2 and SiOx thin films Thin film patterning |
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Plasmas and Acoustic Waves to Pattern the Nanostructure and Chemistry of Thin FilmsRico, VíctorRegodón, G. F.García Valenzuela, AurelioAlcaide, A. M.Oliva Ramirez, ManuelRojas, T. C.Álvarez Molina, RafaelPalomares, F. J.Palmero Acebedo, AlbertoGonzález Elipe, Agustín RodríguezMagnetron sputtering at oblique angleNanostructure and chemistryPlasma-acoustic waves interactionSiO2 and SiOx thin filmsThin film patterningIn this work, piezoelectric AWs and plasmas have been brought together during the growth of a thin film as a novel methodology of plasma-assisted thin film structuration. The ensuing effects have been investigated on a model system where SiO2 and SiOx (x<2) thin films have been deposited by magnetron sputtering at oblique angles (MS-OAD) on an electro-acoustically excited LiNbO3 piezoelectric substrate under resonant conditions. The microstructure of the resulting films was 2D patterned and depicted submillimeter size intermingled zones with different optical characteristics, compositions (SiO2 and SiOx) and porosity, from highly porous to dense and compact regions. The 2D nanostructural pattern mimics the AW distribution and has been accounted for by means of a specific simulation model. It is concluded that the morphological and chemical film pattern replicates the distribution of polarization potential on the surface of the AW activated substrate immersed in the plasma. Moreover, we show that the main mechanism responsible for the appearance of domains with different morphology and chemical composition is the focused impingement of Ar+plasma ions on certain regions of the substrate. The general character of this patterning process, the underlying physics and its possibilities to tailor the composition and microstructure of dielectric thin film materials are discussed.Agencia Estatal de Investigación PID2020-112620GBI00, PID2020-114270RA-I00Junta de Andalucía P18-RT-3480, P18-RT-6079European Union 899352Acta Materialia IncFísica Aplicada IFísica Atómica, Molecular y NuclearAgencia Estatal de Investigación. EspañaEuropean Commission (EC). Fondo Europeo de Desarrollo Regional (FEDER)Junta de AndalucíaEuropean Union (UE). H20202023info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionapplication/pdfapplication/pdfhttps://hdl.handle.net/11441/158817https://doi.org/10.1016/j.actamat.2023.119058reponame:idUS. Depósito de Investigación de la Universidad de Sevillainstname:Universidad de Sevilla (US)InglésActa Materialia, 255, 119058.PID2020-112620GBI00PID2020-114270RA-I00P18-RT-3480P18-RT-6079899352https://doi.org/10.1016/j.actamat.2023.119058info:eu-repo/semantics/openAccessoai:idus.us.es:11441/1588172026-06-17T12:51:07Z |
| dc.title.none.fl_str_mv |
Plasmas and Acoustic Waves to Pattern the Nanostructure and Chemistry of Thin Films |
| title |
Plasmas and Acoustic Waves to Pattern the Nanostructure and Chemistry of Thin Films |
| spellingShingle |
Plasmas and Acoustic Waves to Pattern the Nanostructure and Chemistry of Thin Films Rico, Víctor Magnetron sputtering at oblique angle Nanostructure and chemistry Plasma-acoustic waves interaction SiO2 and SiOx thin films Thin film patterning |
| title_short |
Plasmas and Acoustic Waves to Pattern the Nanostructure and Chemistry of Thin Films |
| title_full |
Plasmas and Acoustic Waves to Pattern the Nanostructure and Chemistry of Thin Films |
| title_fullStr |
Plasmas and Acoustic Waves to Pattern the Nanostructure and Chemistry of Thin Films |
| title_full_unstemmed |
Plasmas and Acoustic Waves to Pattern the Nanostructure and Chemistry of Thin Films |
| title_sort |
Plasmas and Acoustic Waves to Pattern the Nanostructure and Chemistry of Thin Films |
| dc.creator.none.fl_str_mv |
Rico, Víctor Regodón, G. F. García Valenzuela, Aurelio Alcaide, A. M. Oliva Ramirez, Manuel Rojas, T. C. Álvarez Molina, Rafael Palomares, F. J. Palmero Acebedo, Alberto González Elipe, Agustín Rodríguez |
| author |
Rico, Víctor |
| author_facet |
Rico, Víctor Regodón, G. F. García Valenzuela, Aurelio Alcaide, A. M. Oliva Ramirez, Manuel Rojas, T. C. Álvarez Molina, Rafael Palomares, F. J. Palmero Acebedo, Alberto González Elipe, Agustín Rodríguez |
| author_role |
author |
| author2 |
Regodón, G. F. García Valenzuela, Aurelio Alcaide, A. M. Oliva Ramirez, Manuel Rojas, T. C. Álvarez Molina, Rafael Palomares, F. J. Palmero Acebedo, Alberto González Elipe, Agustín Rodríguez |
| author2_role |
author author author author author author author author author |
| dc.contributor.none.fl_str_mv |
Física Aplicada I Física Atómica, Molecular y Nuclear Agencia Estatal de Investigación. España European Commission (EC). Fondo Europeo de Desarrollo Regional (FEDER) Junta de Andalucía European Union (UE). H2020 |
| dc.subject.none.fl_str_mv |
Magnetron sputtering at oblique angle Nanostructure and chemistry Plasma-acoustic waves interaction SiO2 and SiOx thin films Thin film patterning |
| topic |
Magnetron sputtering at oblique angle Nanostructure and chemistry Plasma-acoustic waves interaction SiO2 and SiOx thin films Thin film patterning |
| description |
In this work, piezoelectric AWs and plasmas have been brought together during the growth of a thin film as a novel methodology of plasma-assisted thin film structuration. The ensuing effects have been investigated on a model system where SiO2 and SiOx (x<2) thin films have been deposited by magnetron sputtering at oblique angles (MS-OAD) on an electro-acoustically excited LiNbO3 piezoelectric substrate under resonant conditions. The microstructure of the resulting films was 2D patterned and depicted submillimeter size intermingled zones with different optical characteristics, compositions (SiO2 and SiOx) and porosity, from highly porous to dense and compact regions. The 2D nanostructural pattern mimics the AW distribution and has been accounted for by means of a specific simulation model. It is concluded that the morphological and chemical film pattern replicates the distribution of polarization potential on the surface of the AW activated substrate immersed in the plasma. Moreover, we show that the main mechanism responsible for the appearance of domains with different morphology and chemical composition is the focused impingement of Ar+plasma ions on certain regions of the substrate. The general character of this patterning process, the underlying physics and its possibilities to tailor the composition and microstructure of dielectric thin film materials are discussed. |
| publishDate |
2023 |
| dc.date.none.fl_str_mv |
2023 |
| dc.type.none.fl_str_mv |
info:eu-repo/semantics/article info:eu-repo/semantics/publishedVersion |
| format |
article |
| status_str |
publishedVersion |
| dc.identifier.none.fl_str_mv |
https://hdl.handle.net/11441/158817 https://doi.org/10.1016/j.actamat.2023.119058 |
| url |
https://hdl.handle.net/11441/158817 https://doi.org/10.1016/j.actamat.2023.119058 |
| dc.language.none.fl_str_mv |
Inglés |
| language_invalid_str_mv |
Inglés |
| dc.relation.none.fl_str_mv |
Acta Materialia, 255, 119058. PID2020-112620GBI00 PID2020-114270RA-I00 P18-RT-3480 P18-RT-6079 899352 https://doi.org/10.1016/j.actamat.2023.119058 |
| dc.rights.none.fl_str_mv |
info:eu-repo/semantics/openAccess |
| eu_rights_str_mv |
openAccess |
| dc.format.none.fl_str_mv |
application/pdf application/pdf |
| dc.publisher.none.fl_str_mv |
Acta Materialia Inc |
| publisher.none.fl_str_mv |
Acta Materialia Inc |
| dc.source.none.fl_str_mv |
reponame:idUS. Depósito de Investigación de la Universidad de Sevilla instname:Universidad de Sevilla (US) |
| instname_str |
Universidad de Sevilla (US) |
| reponame_str |
idUS. Depósito de Investigación de la Universidad de Sevilla |
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idUS. Depósito de Investigación de la Universidad de Sevilla |
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1869406247799750656 |
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15,300724 |