Hydrofluoric acid etching of dental zirconia. Part 1: etching mechanism and surface characterization

Rough surfaces have been shown to promote osseointegration, which is one of the keys for a successful dental implantation. Among the diverse treatments proposed to roughen zirconia, hydrofluoric acid (HF) etching appears to be a good candidate, however little is known about this process. In this wor...

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Detalles Bibliográficos
Autores: Flamant, Quentin, García Marro, Fernando|||0000-0003-3542-4332, Roa Rovira, Joan Josep|||0000-0002-7440-0766, Anglada Gomila, Marcos Juan|||0000-0003-4955-3434
Tipo de recurso: artículo
Fecha de publicación:2016
País:España
Institución:Universitat Politècnica de Catalunya (UPC)
Repositorio:UPCommons. Portal del coneixement obert de la UPC
Idioma:inglés
OAI Identifier:oai:upcommons.upc.edu:2117/82829
Acceso en línea:https://hdl.handle.net/2117/82829
https://dx.doi.org/10.1016/j.jeurceramsoc.2015.09.021
Access Level:acceso abierto
Palabra clave:Biomedical materials
Dental Implants
Zirconia
Hydrofluoric
Etching
Dental
Roughness
titanium implants
ceramic implants
oral implants
topography
osteoblast
osseointegration
adhesion
behavior
cells
micrometer
Materials biomèdics
Implants dentals
Àrees temàtiques de la UPC::Enginyeria dels materials
Descripción
Sumario:Rough surfaces have been shown to promote osseointegration, which is one of the keys for a successful dental implantation. Among the diverse treatments proposed to roughen zirconia, hydrofluoric acid (HF) etching appears to be a good candidate, however little is known about this process. In this work, the effect of HF concentration and etching time on the surface topography and chemistry of yttria-stabilized zirconia was assessed. Besides, to understand the etching mechanism, the reaction products present in solution and on the surface were characterized. The results indicate suitable parameters for a fast and uniform roughening of zirconia. The formation of adhered fluoride precipitates on the surface is reported for the first time and highlights the importance of cleaning after etching. Finally, it is shown that monitoring the time allows controlling the surface roughness, smooth rough transition and fractal dimension, which should make possible the fabrication of implants with an optimal topography. (C) 2015 Elsevier Ltd. All rights reserved.