Influence of the yttria content on the mechanical properties of Y2O3-ZrO2 thin films prepared by EB-PVD

A mechanical characterization study of the whole range (ZrO2)1−x–(Y2O3)x system is presented for thin film samples. Films have been prepared by Electron Beam Physical Vapour Deposition (EB-PVD) on Si(1 0 0) substrates. The mechanical characterization, obtained from nanoindentation and Brillouin Ligh...

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Detalles Bibliográficos
Autores: Ochando, I.M., Cáceres, D., García López, J., Escobar-Galindo, Ramón, Jiménez Rioboó, Rafael José, Prieto, C.
Tipo de recurso: artículo
Estado:Versión publicada
Fecha de publicación:2007
País:España
Institución:Universidad de Sevilla (US)
Repositorio:idUS. Depósito de Investigación de la Universidad de Sevilla
OAI Identifier:oai:idus.us.es:11441/147570
Acceso en línea:https://hdl.handle.net/11441/147570
https://doi.org/10.1016/j.vacuum.2007.04.028
Access Level:acceso abierto
Palabra clave:EB-PVD preparation of yttria-stabilized zirconia thin films
Mechanical properties yttria zirconia system
Descripción
Sumario:A mechanical characterization study of the whole range (ZrO2)1−x–(Y2O3)x system is presented for thin film samples. Films have been prepared by Electron Beam Physical Vapour Deposition (EB-PVD) on Si(1 0 0) substrates. The mechanical characterization, obtained from nanoindentation and Brillouin Light scattering (BLS) techniques, shows a monotonous behaviour between the two pure compounds of the series except for the film with 0.08 Y2O3 molar content of yttria-stabilized zirconia (YSZ) solid solution that presents an anomalous hard value. Additionally, BLS is presented as an alternative technique to the study of the mechanical properties of this system.