Epitaxial growth of SrTiO3 films on cube-textured Cu-clad substrates by PLD at low temperature under reducing atmosphere

The growth of epitaxial {001} SrTiO3 (STO) on low-cost cube-textured Cu-based clad substrate at low temperature was carried out by means of pulsed laser deposition (PLD). STO film was deposited in one step under a reducing atmosphere (5% H2 and 95% Ar mixture) to prevent the oxidation of the metal s...

Descripción completa

Detalles Bibliográficos
Autores: Padilla Sánchez, José Antonio, Xuriguera Martín, María Elena, Rodríguez Raurell, Laura, Vannozzi, A., Segarra Rubí, Mercè, Celentano, G., Varela Fernández, Manuel, 1956-
Tipo de recurso: artículo
Estado:Versión publicada
Fecha de publicación:2017
País:España
Institución:Universidad de Barcelona
Repositorio:Dipòsit Digital de la UB
OAI Identifier:oai:diposit.ub.edu:2445/111506
Acceso en línea:https://hdl.handle.net/2445/111506
Access Level:acceso abierto
Palabra clave:Pel·lícules fines
Superconductivitat
Difracció d'electrons
Làsers
Thin films
Superconductivity
Electrons diffraction
Lasers
id ES_2364da2b68808a89f72b545bd50dbcda
oai_identifier_str oai:diposit.ub.edu:2445/111506
network_acronym_str ES
network_name_str España
repository_id_str
spelling Epitaxial growth of SrTiO3 films on cube-textured Cu-clad substrates by PLD at low temperature under reducing atmospherePadilla Sánchez, José AntonioXuriguera Martín, María ElenaRodríguez Raurell, LauraVannozzi, A.Segarra Rubí, MercèCelentano, G.Varela Fernández, Manuel, 1956-Pel·lícules finesSuperconductivitatDifracció d'electronsLàsersThin filmsSuperconductivityElectrons diffractionLasersThe growth of epitaxial {001} SrTiO3 (STO) on low-cost cube-textured Cu-based clad substrate at low temperature was carried out by means of pulsed laser deposition (PLD). STO film was deposited in one step under a reducing atmosphere (5% H2 and 95% Ar mixture) to prevent the oxidation of the metal surface. The optimization of PLD parameters leads to a sharpest biaxial texture at a temperature as low as 500 °C and a thickness of 500 nm with a (100) STO layer. The upper limit of highly textured STO thickness was also investigated. The maximum thickness which retains the best quality {001} texture is 800 nm, since the texture is preserved not only through the layer but also on the surface. Atomic force microscopy (AFM) and scanning electron microscopy (SEM) measurements showed that STO films are continuous, dense, and smooth with very low roughness (between 5 and 7 nm). This paper describes the development of STO layer by means of PLD in absence of oxygen throughout the process, suggesting an alternative and effective method for growing highly {001} textured STO layer on low-cost metal substrates.SpringerOpen2017info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionapplication/pdfhttps://hdl.handle.net/2445/111506Articles publicats en revistes (Ciència dels Materials i Química Física)reponame:Dipòsit Digital de la UBinstname:Universidad de BarcelonaInglésReproducció del document publicat a: https://doi.org/10.1186/s11671-017-1997-9Nanoscale Research Letters, 2017, vol. 12, num. 226https://doi.org/10.1186/s11671-017-1997-9info:eu-repo/grantAgreement/EC/FP7/280432cc-by (c) Padilla Sánchez, José Antonio et al., 2017http://creativecommons.org/licenses/by/3.0/esinfo:eu-repo/semantics/openAccessoai:diposit.ub.edu:2445/1115062026-05-27T06:46:51Z
dc.title.none.fl_str_mv Epitaxial growth of SrTiO3 films on cube-textured Cu-clad substrates by PLD at low temperature under reducing atmosphere
title Epitaxial growth of SrTiO3 films on cube-textured Cu-clad substrates by PLD at low temperature under reducing atmosphere
spellingShingle Epitaxial growth of SrTiO3 films on cube-textured Cu-clad substrates by PLD at low temperature under reducing atmosphere
Padilla Sánchez, José Antonio
Pel·lícules fines
Superconductivitat
Difracció d'electrons
Làsers
Thin films
Superconductivity
Electrons diffraction
Lasers
title_short Epitaxial growth of SrTiO3 films on cube-textured Cu-clad substrates by PLD at low temperature under reducing atmosphere
title_full Epitaxial growth of SrTiO3 films on cube-textured Cu-clad substrates by PLD at low temperature under reducing atmosphere
title_fullStr Epitaxial growth of SrTiO3 films on cube-textured Cu-clad substrates by PLD at low temperature under reducing atmosphere
title_full_unstemmed Epitaxial growth of SrTiO3 films on cube-textured Cu-clad substrates by PLD at low temperature under reducing atmosphere
title_sort Epitaxial growth of SrTiO3 films on cube-textured Cu-clad substrates by PLD at low temperature under reducing atmosphere
dc.creator.none.fl_str_mv Padilla Sánchez, José Antonio
Xuriguera Martín, María Elena
Rodríguez Raurell, Laura
Vannozzi, A.
Segarra Rubí, Mercè
Celentano, G.
Varela Fernández, Manuel, 1956-
author Padilla Sánchez, José Antonio
author_facet Padilla Sánchez, José Antonio
Xuriguera Martín, María Elena
Rodríguez Raurell, Laura
Vannozzi, A.
Segarra Rubí, Mercè
Celentano, G.
Varela Fernández, Manuel, 1956-
author_role author
author2 Xuriguera Martín, María Elena
Rodríguez Raurell, Laura
Vannozzi, A.
Segarra Rubí, Mercè
Celentano, G.
Varela Fernández, Manuel, 1956-
author2_role author
author
author
author
author
author
dc.subject.none.fl_str_mv Pel·lícules fines
Superconductivitat
Difracció d'electrons
Làsers
Thin films
Superconductivity
Electrons diffraction
Lasers
topic Pel·lícules fines
Superconductivitat
Difracció d'electrons
Làsers
Thin films
Superconductivity
Electrons diffraction
Lasers
description The growth of epitaxial {001} SrTiO3 (STO) on low-cost cube-textured Cu-based clad substrate at low temperature was carried out by means of pulsed laser deposition (PLD). STO film was deposited in one step under a reducing atmosphere (5% H2 and 95% Ar mixture) to prevent the oxidation of the metal surface. The optimization of PLD parameters leads to a sharpest biaxial texture at a temperature as low as 500 °C and a thickness of 500 nm with a (100) STO layer. The upper limit of highly textured STO thickness was also investigated. The maximum thickness which retains the best quality {001} texture is 800 nm, since the texture is preserved not only through the layer but also on the surface. Atomic force microscopy (AFM) and scanning electron microscopy (SEM) measurements showed that STO films are continuous, dense, and smooth with very low roughness (between 5 and 7 nm). This paper describes the development of STO layer by means of PLD in absence of oxygen throughout the process, suggesting an alternative and effective method for growing highly {001} textured STO layer on low-cost metal substrates.
publishDate 2017
dc.date.none.fl_str_mv 2017
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv https://hdl.handle.net/2445/111506
url https://hdl.handle.net/2445/111506
dc.language.none.fl_str_mv Inglés
language_invalid_str_mv Inglés
dc.relation.none.fl_str_mv Reproducció del document publicat a: https://doi.org/10.1186/s11671-017-1997-9
Nanoscale Research Letters, 2017, vol. 12, num. 226
https://doi.org/10.1186/s11671-017-1997-9
info:eu-repo/grantAgreement/EC/FP7/280432
dc.rights.none.fl_str_mv cc-by (c) Padilla Sánchez, José Antonio et al., 2017
http://creativecommons.org/licenses/by/3.0/es
info:eu-repo/semantics/openAccess
rights_invalid_str_mv cc-by (c) Padilla Sánchez, José Antonio et al., 2017
http://creativecommons.org/licenses/by/3.0/es
eu_rights_str_mv openAccess
dc.format.none.fl_str_mv application/pdf
dc.publisher.none.fl_str_mv SpringerOpen
publisher.none.fl_str_mv SpringerOpen
dc.source.none.fl_str_mv Articles publicats en revistes (Ciència dels Materials i Química Física)
reponame:Dipòsit Digital de la UB
instname:Universidad de Barcelona
instname_str Universidad de Barcelona
reponame_str Dipòsit Digital de la UB
collection Dipòsit Digital de la UB
repository.name.fl_str_mv
repository.mail.fl_str_mv
_version_ 1869404638501928960
score 15,300719

Similares en LA Referencia