Modelling and Study of a Microwave Plasma Source for High-rate Etching
[EN] The aim of this study is to investigate and to optimize an existing microwave-powered remote plasma source (RPS) with respect to the etching rate and gas temperature and to simplify the setup to save production costs. To achieve these goals, a FEM-based model of the RPS has been developed in or...
| Autores: | , , , , , |
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| Tipo de recurso: | capítulo de libro |
| Fecha de publicación: | 2019 |
| País: | España |
| Institución: | Universitat Politècnica de València (UPV) |
| Repositorio: | RiuNet. Repositorio Institucional de la Universitat Politécnica de Valéncia |
| Idioma: | inglés |
| OAI Identifier: | oai:riunet.upv.es:10251/130169 |
| Acceso en línea: | https://riunet.upv.es/handle/10251/130169 |
| Access Level: | acceso abierto |
| Palabra clave: | Energy Production by Microwaves Microwave CVD EM Modelling Microwave Material interaction Dielectric Properties Dielectric Properties Measurement Solid State Microwave Microwave Processing Microwave Chemistry Microwave applicators design Microwave plasma Remote plasma source Modeling Plasma etching |
| Sumario: | [EN] The aim of this study is to investigate and to optimize an existing microwave-powered remote plasma source (RPS) with respect to the etching rate and gas temperature and to simplify the setup to save production costs. To achieve these goals, a FEM-based model of the RPS has been developed in order to investigate the microwave coupling into the plasma chamber and the microwave field distribution as well as the plasma itself. Different examples of FEM-based microwave simulations at different conditions and their experimental validations will be presented. |
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