Optimization of the Growth Process of Double Perovskite Pr2−δNi1−xMn1+xO6−y Epitaxial Thin Films by RF Sputtering

Epitaxial thin films of Pr2-δNi1-xMn1+xO6-y (PNMO) double perovskite were grown on (001)-oriented SrTiO3 substrates by RF magnetron sputtering. The influence of the growth parameters (oxygen pressure, substrate temperature, and annealing treatments) on the structural, magnetic and transport properti...

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Detalles Bibliográficos
Autores: Bernal Salamanca, Mónica E., Balcells, Lluis, Konstantinović, Zorica, Pomar, Alberto, Martínez, Benjamín, Frontera, Carlos
Tipo de recurso: artículo
Estado:Versión publicada
Fecha de publicación:2022
País:España
Institución:Consejo Superior de Investigaciones Científicas (CSIC)
Repositorio:DIGITAL.CSIC. Repositorio Institucional del CSIC
OAI Identifier:oai:digital.csic.es:10261/283126
Acceso en línea:http://hdl.handle.net/10261/283126
https://api.elsevier.com/content/abstract/scopus_id/85137267490
Access Level:acceso abierto
Palabra clave:Double perovskite
Ferromagnetic insulator
Sputtering thin film growth
Descripción
Sumario:Epitaxial thin films of Pr2-δNi1-xMn1+xO6-y (PNMO) double perovskite were grown on (001)-oriented SrTiO3 substrates by RF magnetron sputtering. The influence of the growth parameters (oxygen pressure, substrate temperature, and annealing treatments) on the structural, magnetic and transport properties, and stoichiometry of the films was thoroughly investigated. It is found that high-quality epitaxial, insulating, and ferromagnetic PNMO thin films can only be obtained in a narrow deposition parameter window. It is shown that a careful selection of the growth conditions allows for obtaining a high degree of Ni/Mn cation ordering, which is reflected in the values of the Curie temperature, TC, and saturation magnetization, MS, which are very close to those of bulk material.