Enhanced terahertz detection of multigate graphene nanostructures

Terahertz (THz) waves have revealed a great potential for use in various fields and for a wide range of challenging applications. High-performance detectors are, however, vital for exploitation of THz technology. Graphene plasmonic THz detectors have proven to be promising optoelectronic devices, bu...

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Detalles Bibliográficos
Autores: Delgado Notario, Juan Antonio, Knap, Wojciech, Clericò, Vito, Salvador-Sanchez, Juan, Calvo Gallego, Jaime, Taniguchi, Takashi, Watanabe, Kenji, Otsuji, Taiichi, Popov, Vyacheslav V., Fateev, Denis V., Diez, Enrique, Velázquez Pérez, Jesús Enrique, Meziani, Yahya M.
Tipo de recurso: artículo
Estado:Versión publicada
Fecha de publicación:2022
País:España
Institución:Universidad de Salamanca (USAL)
Repositorio:GREDOS. Repositorio Institucional de la Universidad de Salamanca
OAI Identifier:oai:gredos.usal.es:10366/160383
Acceso en línea:http://hdl.handle.net/10366/160383
Access Level:acceso abierto
Palabra clave:2D materials
Field effect transistor
Graphene
Nano-photodetector
Plasmonics
Terahertz
1203 Ciencia de los ordenadores
3325 Tecnología de las Telecomunicaciones
3307 Tecnología Electrónica
Descripción
Sumario:Terahertz (THz) waves have revealed a great potential for use in various fields and for a wide range of challenging applications. High-performance detectors are, however, vital for exploitation of THz technology. Graphene plasmonic THz detectors have proven to be promising optoelectronic devices, but improving their performance is still necessary. In this work, an asymmetric-dual-grating-gate graphene-terahertz-field-effect-transistor with a graphite back-gate was fabricated and characterized under illumination of 0.3 THz radiation in the temperature range from 4.5 K up to the room temperature. The device was fabricated as a sub-THz detector using a heterostructure of h-BN/Graphene/h-BN/Graphite to make a transistor with a double asymmetric-grating-top-gate and a continuous graphite back-gate. By biasing the metallic top-gates and the graphite back-gate, abrupt n+n (or p+p) or np (or pn) junctions with different potential barriers are formed along the graphene layer leading to enhancement of the THz rectified signal by about an order of magnitude. The plasmonic rectification for graphene containing np junctions is interpreted as due to the plasmonic electron-hole ratchet mechanism, whereas, for graphene with n+n junctions, rectification is attributed to the differential plasmonic drag effect. This work shows a new way of responsivity enhancement and paves the way towards new record performances of graphene THz nano-photodetectors.