Carrier Concentration Analysis in 1.2 kV SiC Schottky Diodes Under Current Crowding

Die-level current crowding phenomena are analyzed at the microsecond timescale with an internal IR-Laser Deflection set-up. To this end, the 4H-SiC plasma-optical coefficient for the refractive index is reported for the first time. A SiC Schottky diode with an edge termination based on a junction te...

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Bibliographic Details
Authors: Bonet, Ferran, Aviñó Salvadó, Oriol, Vellvehi, Miquel, Jorda, Xavier, Godignon, Philippe, Perpiñà, Xavier
Format: article
Status:Versión aceptada para publicación
Publication Date:2022
Country:España
Institution:Consejo Superior de Investigaciones Científicas (CSIC)
Repository:DIGITAL.CSIC. Repositorio Institucional del CSIC
OAI Identifier:oai:digital.csic.es:10261/345270
Online Access:http://hdl.handle.net/10261/345270
https://api.elsevier.com/content/abstract/scopus_id/85129631806
Access Level:Open access
Keyword:current crowding | filamentary conduction | IIR-LD | plasma-optical coefficient | SiC Schottky diode
Description
Summary:Die-level current crowding phenomena are analyzed at the microsecond timescale with an internal IR-Laser Deflection set-up. To this end, the 4H-SiC plasma-optical coefficient for the refractive index is reported for the first time. A SiC Schottky diode with an edge termination based on a junction termination extension is used as a test vehicle. Under biasing conditions, the edge termination starts a local bipolar conduction along the device active area perimeter, leading to current crowding effects. Using refractive index measurements, a depth-resolved carrier profile is extracted and assessed using both, simulation and Free Carrier Absorption measurements.