Production of nanometric particles in radio frequency glow discharges in mixtures of silane and methane
The formation of silicon particles in rf glow discharges has attracted attention due to their effect as a contaminant during film deposition or etching. However, silicon and silicon alloy powders produced by plasma¿enhanced chemical vapor deposition (PECVD) are promising new materials for sintering...
| Autores: | , , , |
|---|---|
| Tipo de recurso: | artículo |
| Estado: | Versión publicada |
| Fecha de publicación: | 1996 |
| País: | España |
| Institución: | Varias* (Consorci de Biblioteques Universitáries de Catalunya, Centre de Serveis Científics i Acadèmics de Catalunya) |
| Repositorio: | Recercat. Dipósit de la Recerca de Catalunya |
| OAI Identifier: | oai:recercat.cat:2445/25045 |
| Acceso en línea: | https://hdl.handle.net/2445/25045 |
| Access Level: | acceso abierto |
| Palabra clave: | Radiofreqüència Ceràmica industrial Aliatges de silici Pel·lícules fines Radio frequency Ceramics Silicon alloys Thin films |
| id |
ES_023b047dfd16d6b4c4ef255a565b5cdd |
|---|---|
| oai_identifier_str |
oai:recercat.cat:2445/25045 |
| network_acronym_str |
ES |
| network_name_str |
España |
| repository_id_str |
|
| spelling |
Production of nanometric particles in radio frequency glow discharges in mixtures of silane and methaneBertrán Serra, EnricCosta i Balanzat, JosepViera Mármol, GregorioZhang, R. Q.RadiofreqüènciaCeràmica industrialAliatges de siliciPel·lícules finesRadio frequencyCeramicsSilicon alloysThin filmsThe formation of silicon particles in rf glow discharges has attracted attention due to their effect as a contaminant during film deposition or etching. However, silicon and silicon alloy powders produced by plasma¿enhanced chemical vapor deposition (PECVD) are promising new materials for sintering ceramics, for making nanoscale filters, or for supporting catalytic surfaces. Common characteristics of these powders are their high purity and the easy control of their stoichiometry through the composition of the precursor gas mixture. Plasma parameters also influence their structure. Nanometric powders of silicon¿carbon alloys exhibiting microstructural properties such as large hydrogen content and high surface/volume ratio have been produced in a PECVD reactor using mixtures of silane and methane at low pressure (-1 Torr) and low frequency square¿wave modulated rf power (13.56 MHz). The a¿Si1¿xCx:H powders were obtained from different precursor gas mixtures, from R=0.05 to R=9, where R=[SiH4]/([SiH4]+[CH4]). The structure of the a¿Si1¿xCx:H powder was analyzed by several techniques. The particles appeared agglomerated, with a wide size distribution between 5 and 100 nm. The silane/methane gas mixture determined the vibrational features of these powders in the infrared. Silicon-hydrogen groups were present for every gas composition, whereas carbon¿hydrogen and silicon¿carbon bonds appeared in methane¿rich mixtures (R-0.6). The thermal desorption of hydrogen revealed two main evolutions at about 375 and 660¿°C that were ascribed to hydrogen bonded to silicon and carbon, respectively. The estimated hydrogen atom concentration in the sample was about 50%.American Institute of Physics201220121996info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersion5 p.application/pdfhttps://hdl.handle.net/2445/25045Articles publicats en revistes (Física Aplicada)reponame:Recercat. Dipósit de la Recerca de Catalunyainstname:Varias* (Consorci de Biblioteques Universitáries de Catalunya, Centre de Serveis Científics i Acadèmics de Catalunya)InglésReproducció del document publicat a: http://dx.doi.org/10.1116/1.580146Journal of Vacuum Science Technology A-Vacuum Surfaces and Films, 1996, p. 567-571http://dx.doi.org/10.1116/1.580146(c) American Institute of Physics, 1996info:eu-repo/semantics/openAccessoai:recercat.cat:2445/250452026-05-29T05:05:01Z |
| dc.title.none.fl_str_mv |
Production of nanometric particles in radio frequency glow discharges in mixtures of silane and methane |
| title |
Production of nanometric particles in radio frequency glow discharges in mixtures of silane and methane |
| spellingShingle |
Production of nanometric particles in radio frequency glow discharges in mixtures of silane and methane Bertrán Serra, Enric Radiofreqüència Ceràmica industrial Aliatges de silici Pel·lícules fines Radio frequency Ceramics Silicon alloys Thin films |
| title_short |
Production of nanometric particles in radio frequency glow discharges in mixtures of silane and methane |
| title_full |
Production of nanometric particles in radio frequency glow discharges in mixtures of silane and methane |
| title_fullStr |
Production of nanometric particles in radio frequency glow discharges in mixtures of silane and methane |
| title_full_unstemmed |
Production of nanometric particles in radio frequency glow discharges in mixtures of silane and methane |
| title_sort |
Production of nanometric particles in radio frequency glow discharges in mixtures of silane and methane |
| dc.creator.none.fl_str_mv |
Bertrán Serra, Enric Costa i Balanzat, Josep Viera Mármol, Gregorio Zhang, R. Q. |
| author |
Bertrán Serra, Enric |
| author_facet |
Bertrán Serra, Enric Costa i Balanzat, Josep Viera Mármol, Gregorio Zhang, R. Q. |
| author_role |
author |
| author2 |
Costa i Balanzat, Josep Viera Mármol, Gregorio Zhang, R. Q. |
| author2_role |
author author author |
| dc.subject.none.fl_str_mv |
Radiofreqüència Ceràmica industrial Aliatges de silici Pel·lícules fines Radio frequency Ceramics Silicon alloys Thin films |
| topic |
Radiofreqüència Ceràmica industrial Aliatges de silici Pel·lícules fines Radio frequency Ceramics Silicon alloys Thin films |
| description |
The formation of silicon particles in rf glow discharges has attracted attention due to their effect as a contaminant during film deposition or etching. However, silicon and silicon alloy powders produced by plasma¿enhanced chemical vapor deposition (PECVD) are promising new materials for sintering ceramics, for making nanoscale filters, or for supporting catalytic surfaces. Common characteristics of these powders are their high purity and the easy control of their stoichiometry through the composition of the precursor gas mixture. Plasma parameters also influence their structure. Nanometric powders of silicon¿carbon alloys exhibiting microstructural properties such as large hydrogen content and high surface/volume ratio have been produced in a PECVD reactor using mixtures of silane and methane at low pressure (-1 Torr) and low frequency square¿wave modulated rf power (13.56 MHz). The a¿Si1¿xCx:H powders were obtained from different precursor gas mixtures, from R=0.05 to R=9, where R=[SiH4]/([SiH4]+[CH4]). The structure of the a¿Si1¿xCx:H powder was analyzed by several techniques. The particles appeared agglomerated, with a wide size distribution between 5 and 100 nm. The silane/methane gas mixture determined the vibrational features of these powders in the infrared. Silicon-hydrogen groups were present for every gas composition, whereas carbon¿hydrogen and silicon¿carbon bonds appeared in methane¿rich mixtures (R-0.6). The thermal desorption of hydrogen revealed two main evolutions at about 375 and 660¿°C that were ascribed to hydrogen bonded to silicon and carbon, respectively. The estimated hydrogen atom concentration in the sample was about 50%. |
| publishDate |
1996 |
| dc.date.none.fl_str_mv |
1996 2012 2012 |
| dc.type.none.fl_str_mv |
info:eu-repo/semantics/article info:eu-repo/semantics/publishedVersion |
| format |
article |
| status_str |
publishedVersion |
| dc.identifier.none.fl_str_mv |
https://hdl.handle.net/2445/25045 |
| url |
https://hdl.handle.net/2445/25045 |
| dc.language.none.fl_str_mv |
Inglés |
| language_invalid_str_mv |
Inglés |
| dc.relation.none.fl_str_mv |
Reproducció del document publicat a: http://dx.doi.org/10.1116/1.580146 Journal of Vacuum Science Technology A-Vacuum Surfaces and Films, 1996, p. 567-571 http://dx.doi.org/10.1116/1.580146 |
| dc.rights.none.fl_str_mv |
(c) American Institute of Physics, 1996 info:eu-repo/semantics/openAccess |
| rights_invalid_str_mv |
(c) American Institute of Physics, 1996 |
| eu_rights_str_mv |
openAccess |
| dc.format.none.fl_str_mv |
5 p. application/pdf |
| dc.publisher.none.fl_str_mv |
American Institute of Physics |
| publisher.none.fl_str_mv |
American Institute of Physics |
| dc.source.none.fl_str_mv |
Articles publicats en revistes (Física Aplicada) reponame:Recercat. Dipósit de la Recerca de Catalunya instname:Varias* (Consorci de Biblioteques Universitáries de Catalunya, Centre de Serveis Científics i Acadèmics de Catalunya) |
| instname_str |
Varias* (Consorci de Biblioteques Universitáries de Catalunya, Centre de Serveis Científics i Acadèmics de Catalunya) |
| reponame_str |
Recercat. Dipósit de la Recerca de Catalunya |
| collection |
Recercat. Dipósit de la Recerca de Catalunya |
| repository.name.fl_str_mv |
|
| repository.mail.fl_str_mv |
|
| _version_ |
1869402640023027712 |
| score |
15,811543 |