Evaluating the corrosion resistance of ubm-deposited cr/crn multilayers
This work was aimed at evaluating the corrosion resistance of multilayer Cr/CrN coatings deposited by the unbalan-ced magnetron sputtering (UBM) technique. Coatings were produced at room temperature using 400 mA discharge current, 9 sccm argon flow and 3 sccm nitrogen flow. The total thickness of co...
| Autores: | , , |
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| Tipo de recurso: | artículo |
| Estado: | Versión publicada |
| Fecha de publicación: | 2011 |
| País: | Colombia |
| Institución: | Universidad Nacional de Colombia |
| Repositorio: | Repositorio UN |
| Idioma: | español |
| OAI Identifier: | oai:repositorio.unal.edu.co:unal/33467 |
| Acceso en línea: | https://repositorio.unal.edu.co/handle/unal/33467 http://bdigital.unal.edu.co/23547/ http://bdigital.unal.edu.co/23547/2/ http://bdigital.unal.edu.co/23547/3/ |
| Access Level: | acceso abierto |
| Palabra clave: | sputtering con magnetrón desbalancea-do polarización potenciodinámica películas delgadas resistencia a la corrosión Cr/CrN. Unbalanced magnetron sputtering potentiodynamic polarisation thin film corrosion resistance |
| Sumario: | This work was aimed at evaluating the corrosion resistance of multilayer Cr/CrN coatings deposited by the unbalan-ced magnetron sputtering (UBM) technique. Coatings were produced at room temperature using 400 mA discharge current, 9 sccm argon flow and 3 sccm nitrogen flow. The total thickness of coatings deposited on AISI 304 stainless steel and silicon (100) varied between 0.2 a 3 μm as bilayer period varied between 20 and 200 nm. Coating microstructure and chemical composition was stu-died through scanning electron microscopy (SEM) and tex-ture and crystalline phases were analysed by X-ray diffraction (XRD) before and after corrosion tests which were carried out by potentiodynamic polarisation using 0.5 M H2SO4 + 0.05M KSCN solution. Lower bilayer period coatings presented better corrosion resistance and their corrosion mechanism is discussed in this article. |
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