Study of the kinetic behavior of mandelic acid oxidation by vanadium(V) in sulfuric acid medium: effect of CTAB presence
The mandelic acid oxidation by vanadium (V) in sulfuric acid medium was studied at 303 K. The reaction rate was determined spectrophotometrically by means of the formation of vanadium (IV) at 760 nm. The oxidation reaction showed first order dependence in terms of vanadium (V)The mandelic acid oxida...
| Autores: | , , |
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| Tipo de recurso: | artículo |
| Estado: | Versión publicada |
| Fecha de publicación: | 2006 |
| País: | Brasil |
| Institución: | Universidade Estadual de Londrina (UEL) |
| Repositorio: | Revista Semina: Ciências Exatas e Tecnológicas (Online) |
| Idioma: | portugués |
| OAI Identifier: | oai:ojs2.ojs.uel.br:article/1877 |
| Acceso en línea: | https://ojs.uel.br/revistas/uel/index.php/semexatas/article/view/1877 |
| Access Level: | acceso abierto |
| Palabra clave: | Mandelic acid á-hydroxyacid Oxidation by vanadium (V). Ácido mandélico a-hidroxiácido Oxidação por vanádio(V)M. Oxidação de ácido mandélico |
| Sumario: | The mandelic acid oxidation by vanadium (V) in sulfuric acid medium was studied at 303 K. The reaction rate was determined spectrophotometrically by means of the formation of vanadium (IV) at 760 nm. The oxidation reaction showed first order dependence in terms of vanadium (V)The mandelic acid oxidation by vanadium (V) in sulfuric acid medium was studied at 303 K. The reaction rate was determined spectrophotometrically by means of the formation of vanadium (IV) at 760 nm. The oxidation reaction showed first order dependence in terms of vanadium (V). |
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