Electrical performance of conducting polymer (SPAN) grown on GaAs with different substrate orientations

This article reports the effect of n-type GaAs substrate orientation, namely (100), (311)A and (311)B, on the electrical properties of sulfonated polyaniline (SPAN)/GaAs heterojunction devices. In addition, the inhomogeneity of the interface between various GaAs substrates and SPAN is investigated i...

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Detalles Bibliográficos
Autores: Jameel, D.A., Aziz, M., Felix, J.F., Al Saqri, N., Taylor, D., Albalawi, H., Alghamdi, H., Al Mashary, F., Henini, M.
Tipo de recurso: artículo
Estado:Versión publicada
Fecha de publicación:2016
País:Brasil
Institución:Universidade Federal de Viçosa (UFV)
Repositorio:LOCUS Repositório Institucional da UFV
Idioma:inglés
OAI Identifier:oai:locus.ufv.br:123456789/21360
Acceso en línea:https://doi.org/10.1016/j.apsusc.2016.06.097
http://www.locus.ufv.br/handle/123456789/21360
Access Level:acceso abierto
Palabra clave:(100) GaAs
(311)A GaAs
(311)B GaAs
I–V and C-V
Descripción
Sumario:This article reports the effect of n-type GaAs substrate orientation, namely (100), (311)A and (311)B, on the electrical properties of sulfonated polyaniline (SPAN)/GaAs heterojunction devices. In addition, the inhomogeneity of the interface between various GaAs substrates and SPAN is investigated in terms of barrier height and ideality factor by performing I–V measurements at different temperatures (20–420 K). The I–V results indicate that the value of the rectification ratio (IF/IR) at 0.5 V is higher for SPAN/(311)B GaAs samples than for SPAN/(100) GaAs and SPAN/(311)A GaAs samples. Moreover, the barrier height decreases and the ideality factor increases with decreasing temperature for all three heterostructure devices. The high value of mean barrier Φ¯b of SPAN/(311)B (calculated from the plots of Φb0 as a function of 1/2kT) confirms that the GaAs substrate orientation results in an increase of barrier homogeneities. Furthermore, the C-V characteristics were obtained at room temperature. The C-V measurements showed that the carrier distributions at the interface and away from the interface in high index (311) GaAs orientations are more uniform and have better barrier homogeneity than those grown on the conventional (100) GaAs substrates.