Dynamic and static calibration of ultra-low-voltage, digital-based operational transconductance amplifiers

The calibration of the effects of process variations and device mismatch in Ultra Low Voltage (ULV) Digital-Based Operational Transconductance Amplifiers (DB-OTAs) is addressed in this paper. For this purpose, two dynamic calibration techniques, intended to dynamically vary the effective strength of...

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Detalles Bibliográficos
Autores: Toledo, Pedro Filipe Leite Correia de, Crovetti, Paolo Stefano, Klimach, Hamilton Duarte, Bampi, Sergio
Tipo de recurso: artículo
Estado:Versión publicada
Fecha de publicación:2020
País:Brasil
Institución:Universidade Federal do Rio Grande do Sul (UFRGS)
Repositorio:Repositório Institucional da UFRGS
Idioma:inglés
OAI Identifier:oai:www.lume.ufrgs.br:10183/212747
Acceso en línea:http://hdl.handle.net/10183/212747
Access Level:acceso abierto
Palabra clave:Tensão elétrica
Amplificadores operacionais
Calibração
Ultra-low-voltage
Operational transconductance amplifier (OTA)
Digital-based OTA (DB-OTA)
Fully-digital design
Dynamic calibration
Static calibration
Descripción
Sumario:The calibration of the effects of process variations and device mismatch in Ultra Low Voltage (ULV) Digital-Based Operational Transconductance Amplifiers (DB-OTAs) is addressed in this paper. For this purpose, two dynamic calibration techniques, intended to dynamically vary the effective strength of critical gates by different modulation strategies, i.e., Digital Pulse Width Modulation (DPWM) and Dyadic Digital Pulse Modulation (DDPM), are explored and compared to classic static calibration. The effectiveness of the calibration approaches as a mean to recover acceptable performance in non-functional samples is verified by Monte-Carlo (MC) post-layout simulations performed on a 300 mV power supply, nW-power DB-OTA in 180 nm CMOS. Based on the same MC post-layout simulations, the impact of each calibration strategy on silicon area, power consumption, and OTA performance is discussed.