Investigation of laser annealing mechanisms in thin film coatings by photothermal microscopy
We study the evolution of the absorptance of amorphous metal oxide thin films when exposed to intense CW laser radiation measured using a photothermal microscope. The evolution of the absorptance is characterized by a nonexponential decay. Different models that incorporate linear and nonlinear absor...
| Autores: | , , , , |
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| Tipo de recurso: | artículo |
| Estado: | Versión publicada |
| Fecha de publicación: | 2019 |
| País: | Argentina |
| Institución: | Consejo Nacional de Investigaciones Científicas y Técnicas |
| Repositorio: | CONICET Digital (CONICET) |
| Idioma: | inglés |
| OAI Identifier: | oai:ri.conicet.gov.ar:11336/118189 |
| Acceso en línea: | http://hdl.handle.net/11336/118189 |
| Access Level: | acceso abierto |
| Palabra clave: | laser annealing mechanisms photothermal microscopy thin film coatings https://purl.org/becyt/ford/2.5 https://purl.org/becyt/ford/2 |
| Sumario: | We study the evolution of the absorptance of amorphous metal oxide thin films when exposed to intense CW laser radiation measured using a photothermal microscope. The evolution of the absorptance is characterized by a nonexponential decay. Different models that incorporate linear and nonlinear absorption, free carrier absorption, and defect diffusion are used to fit the results, with constraints imposed on the fit parameters to scale with power and intensity. The model that best fits is that two types of interband defects are passivated independently, one by a one-photon process and the other one by a two-photon process. |
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