Resistance switching and formation of a conductive bridge in metal/binary oxide/metal structure for memory devices

The resistance switching mechanism of a metal/CuO/metal sandwich with a planar device structure has been studied. We report the direct observation of a conducting bridge within the CuO channel of the device, which is formed upon the initial voltage application (forming process). It is found that the...

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Detalles Bibliográficos
Autores: Fujiwara, Kohei, Nemoto, Takumi, Rozenberg, Marcelo Javier, Nakamura, Yoshinobu, Takagi, Hidenori
Tipo de recurso: artículo
Estado:Versión publicada
Fecha de publicación:2008
País:Argentina
Institución:Consejo Nacional de Investigaciones Científicas y Técnicas
Repositorio:CONICET Digital (CONICET)
Idioma:inglés
OAI Identifier:oai:ri.conicet.gov.ar:11336/61544
Acceso en línea:http://hdl.handle.net/11336/61544
Access Level:acceso abierto
Palabra clave:Cuo
Dielectric Breakdown
Memory Effect
Reduction-Oxidation
Reram
Resistance Switching
https://purl.org/becyt/ford/1.3
https://purl.org/becyt/ford/1
Descripción
Sumario:The resistance switching mechanism of a metal/CuO/metal sandwich with a planar device structure has been studied. We report the direct observation of a conducting bridge within the CuO channel of the device, which is formed upon the initial voltage application (forming process). It is found that the resistance switching phenomenon only occurs when just a single bridge is formed during a soft dielectric breakdown. We argue that the reduction and oxidation of this conducting bridge by the action of an applied field and/or current gives rise to a novel nonvolatile memory effect. © 2008 The Japan Society of Applied Physics.