Study of the structure of titanium thin films deposited with a vacuum arc as a function of the thickness

Polycrystalline titanium thin films have been widely employed as interlayer between the substrate and different coatings in order to improve adhesion strength, corrosion resistance and wear performance, as well as to promote the growth of crystalline phases of the coating. The thickness of the Ti la...

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Detalhes bibliográficos
Autores: Fazio, Mariana Andrea, Vega, Daniel Roberto, Kleiman, Ariel Javier, Colombo, Diego Alejandro, Franco Arias, Lina Maria, Marquez, Adriana Beatriz
Formato: artículo
Estado:Versión publicada
Fecha de publicación:2015
País:Argentina
Recursos:Consejo Nacional de Investigaciones Científicas y Técnicas
Repositorio:CONICET Digital (CONICET)
Idioma:inglés
OAI Identifier:oai:ri.conicet.gov.ar:11336/128485
Acesso em linha:http://hdl.handle.net/11336/128485
Access Level:acceso abierto
Palavra-chave:FACE CENTERED CUBIC TITANIUM PHASE
FILMS
THIN FILMS
TITANIUM
VACUUM ARC DISCHARGE
https://purl.org/becyt/ford/1.3
https://purl.org/becyt/ford/1
Descrição
Resumo:Polycrystalline titanium thin films have been widely employed as interlayer between the substrate and different coatings in order to improve adhesion strength, corrosion resistance and wear performance, as well as to promote the growth of crystalline phases of the coating. The thickness of the Ti layer can be relevant on the behavior of the coatings, however very few studies have been carried out. In this work, the crystal structure of polycrystalline titanium films deposited with a vacuum arc discharge on monocrystalline silicon wafers (100) was studied and a dependence on the film thickness was found. The presence of the fcc phase of titanium was observed for the thinnest films with a critical thickness estimated in 300 nm, a much larger value than those reported for other deposition processes. For larger thicknesses, the films grew as α-titanium with a preferred orientation in the [100] direction. The obtained results agreed with a growth model based on the matching between the film and the substrate lattice. The characteristics of the films deposited in two steps, which had not been previously investigated, reinforced the suggested model.