Nickel hydroxide films in contact with an electroactive solution : A study employing electrochemical impedance measurements
The deactivation of nickel hydroxide films after prolonged storage times without use was studied. This study was carried out in the context of the Rotating Disc Electrode Voltammetry (RDEV) and Electrochemical Impedance Spectroscopy (EIS) when the nickel hydroxide film contacts an electroactive solu...
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| Tipo de recurso: | artículo |
| Estado: | Versión publicada |
| Fecha de publicación: | 2016 |
| País: | Argentina |
| Institución: | Universidad Nacional de La Plata |
| Repositorio: | SEDICI (UNLP) |
| Idioma: | inglés |
| OAI Identifier: | oai:sedici.unlp.edu.ar:10915/101024 |
| Acceso en línea: | http://sedici.unlp.edu.ar/handle/10915/101024 |
| Access Level: | acceso abierto |
| Palabra clave: | Química Nickel hydroxide Charge transport parameters Ion and electron diffusion coefficients Gold/nickel hydroxide and nickel hydroxide/solution interfacial resistance |
| Sumario: | The deactivation of nickel hydroxide films after prolonged storage times without use was studied. This study was carried out in the context of the Rotating Disc Electrode Voltammetry (RDEV) and Electrochemical Impedance Spectroscopy (EIS) when the nickel hydroxide film contacts an electroactive solution and a redox reaction occurs at the Au-Ni(OH)2|electrolyte interface. Deferasirox (4-(3,5-bis(2-hydroxyphenyl)-1,2,4-triazol-1-yl) benzoic acid) was employed as redox species in solution. Limiting currents vs. electrode rotation rate dependences allowed one to obtain variation of the charge transport rate on the storage time. EIS was employed to obtain a more complete series of charge-transport parameters, that is, electron and ion diffusion coefficients and different interfacial resistances related to the gold/nickel hydroxide and nickel hydroxide/solution interfaces. |
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