Generation of nanocomposites based on (PMMA-b-PCL)-grafted Fe2O3 nanoparticles and PS-b-PCL block copolymer

The aim of this work is to obtain a good dispersion of Fe2O3 magnetic nanoparticles into a PS-b-PCL diblock copolymer. For this purpose nanoparticles have been modified in their surface by grafting a PMMA-b-PCL block copolymer into their surface, after being silanized. The grafting process has been...

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Detalhes bibliográficos
Autores: Barandarian, Irati, Cappelletti, Ariel Leonardo, Strumia, Miriam Cristina, Eceiza, Arantxa, Kortaberria, Galder
Formato: artículo
Estado:Versión publicada
Fecha de publicación:2014
País:Argentina
Recursos:Consejo Nacional de Investigaciones Científicas y Técnicas
Repositorio:CONICET Digital (CONICET)
Idioma:inglés
OAI Identifier:oai:ri.conicet.gov.ar:11336/10590
Acesso em linha:http://hdl.handle.net/11336/10590
Access Level:acceso abierto
Palavra-chave:Magnetic Nanoparticles
Block Copolymer
Atomic Force Microscopy
Grafting
https://purl.org/becyt/ford/1.4
https://purl.org/becyt/ford/1
Descrição
Resumo:The aim of this work is to obtain a good dispersion of Fe2O3 magnetic nanoparticles into a PS-b-PCL diblock copolymer. For this purpose nanoparticles have been modified in their surface by grafting a PMMA-b-PCL block copolymer into their surface, after being silanized. The grafting process has been probed by infrared spectroscopy, thermogravimetric analysis and transmission electron microscopy. Once modified, nanoparticles have been dispersed into the block copolymer. Nanostructured lamellar morphology of the block copolymer after annealing process has not been affected by the presence of nanoparticles, as has been probed by atomic force microscopy. Furthermore, their dispersion into the matrix has been improved when compared with unmodified nanoparticles. Though during modification process small aggregates of nanoparticles surrounded by PMMA-b-PCL brushes have been formed, morphology has not been altered or disrupted. Modified nanoparticles have been mostly placed at the interfaces among PS and PCL domains.