Ellipsometry and electron diffraction study of anodically formed Pd oxide layer

Anodic Pd oxide films grown in l M H<sub>2</sub>SO<sub>4</sub> and l M HClO<sub>4</sub> during the time τ(15s ⩽ τ ⩽ 9000 s) at the potential E<sub>τ</sub>(1.90 V ⩽ E<sub>τ</sub> ⩽ 2.06 V) have been investigated by ellipsometry and electron...

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Detalles Bibliográficos
Autores: Bolzán, Agustín Eduardo, Zerbino, Jorge Omar, Macchi, E., Arvia, Alejandro Jorge
Tipo de recurso: artículo
Estado:Versión publicada
Fecha de publicación:1993
País:Argentina
Institución:Universidad Nacional de La Plata
Repositorio:SEDICI (UNLP)
Idioma:inglés
OAI Identifier:oai:sedici.unlp.edu.ar:10915/120775
Acceso en línea:http://sedici.unlp.edu.ar/handle/10915/120775
Access Level:acceso abierto
Palabra clave:Ciencias Exactas
Química
Pd oxide layers
Electrochemistry
Descripción
Sumario:Anodic Pd oxide films grown in l M H<sub>2</sub>SO<sub>4</sub> and l M HClO<sub>4</sub> during the time τ(15s ⩽ τ ⩽ 9000 s) at the potential E<sub>τ</sub>(1.90 V ⩽ E<sub>τ</sub> ⩽ 2.06 V) have been investigated by ellipsometry and electron diffraction techniques. Ellipsometry confirms the duplex structure of the anodic Pd oxide films earlier concluded from electrochemical data. Electron diffraction reveals epitaxial growth of PdO on Pd at early stages. The film thickness fits a logarithmic growth rate equation for oxide layer thicknesses greater than 10–20nm, depending on the solution composition.