A comparative study of electrodeposited and vapour deposited gold films : Fractal surface characterization through scanning tunnelling microscopy

The surfaces of Au deposits grown under non-equilibrium conditions from either the electroreduction of Au oxide or from the vapour have been analysed as fractals by measuring the perimeter (P) and the area (A) of intergranular voids. The values of P and A were determined from scanning tunnelling mic...

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Detalles Bibliográficos
Autores: Herrasti, P., Ocón, P., Salvarezza, Roberto Carlos, Vara, J. M., Vásquez, L., Arvia, Alejandro Jorge
Tipo de recurso: artículo
Estado:Versión publicada
Fecha de publicación:1992
País:Argentina
Institución:Universidad Nacional de La Plata
Repositorio:SEDICI (UNLP)
Idioma:inglés
OAI Identifier:oai:sedici.unlp.edu.ar:10915/118415
Acceso en línea:http://sedici.unlp.edu.ar/handle/10915/118415
Access Level:acceso abierto
Palabra clave:Ciencias Exactas
Química
Fractal surfaces
Scanning tunneling microscopy
Electrocrystallization
Metal vapour deposition
Gold electrodes
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spelling A comparative study of electrodeposited and vapour deposited gold films : Fractal surface characterization through scanning tunnelling microscopyHerrasti, P.Ocón, P.Salvarezza, Roberto CarlosVara, J. M.Vásquez, L.Arvia, Alejandro JorgeCiencias ExactasQuímicaFractal surfacesScanning tunneling microscopyElectrocrystallizationMetal vapour depositionGold electrodesThe surfaces of Au deposits grown under non-equilibrium conditions from either the electroreduction of Au oxide or from the vapour have been analysed as fractals by measuring the perimeter (P) and the area (A) of intergranular voids. The values of P and A were determined from scanning tunnelling microscopy (STM) topographic imaging of the deposit surfaces. A frsctal behaviour P ∝ 4 <sup>D/2</sup> was found with D = 1.5 ± 0.1 and D = 1.7 ± 0.1 for the electrodeposited and vapour deposited Au iilms, respectively. These figures remain constant for film thicknesses between 100 and 1000 mn. The value of D, the fractal dimension of the surfaces, is 2.5 ± 0.1 for the Au electrodeposits, and 2.7 + 0.1 for the Au vapour deposited films. The former value is consistent with either a diffusion or an electric field controlled growth model, whereas the latter is in agreement with a ballistic growth model.Instituto de Investigaciones Fisicoquímicas Teóricas y Aplicadas1992info:eu-repo/semantics/articleinfo:eu-repo/semantics/publishedVersionArticulohttp://purl.org/coar/resource_type/c_6501info:ar-repo/semantics/articuloapplication/pdf2209-2214http://sedici.unlp.edu.ar/handle/10915/118415enginfo:eu-repo/semantics/altIdentifier/issn/am-4686/9info:eu-repo/semantics/openAccesshttp://creativecommons.org/licenses/by-nc-sa/4.0/Creative Commons Attribution-NonCommercial-ShareAlike 4.0 International (CC BY-NC-SA 4.0)reponame:SEDICI (UNLP)instname:Universidad Nacional de La Platainstacron:UNLP2024-05-08T13:06:07Zoai:sedici.unlp.edu.ar:10915/118415Institucionalhttp://sedici.unlp.edu.ar/Universidad públicaNo correspondehttp://sedici.unlp.edu.ar/oai/snrdalira@sedici.unlp.edu.arArgentinaNo correspondeNo correspondeNo correspondeopendoar:13292024-05-08 13:06:08.006SEDICI (UNLP) - Universidad Nacional de La Platafalse
dc.title.none.fl_str_mv A comparative study of electrodeposited and vapour deposited gold films : Fractal surface characterization through scanning tunnelling microscopy
title A comparative study of electrodeposited and vapour deposited gold films : Fractal surface characterization through scanning tunnelling microscopy
spellingShingle A comparative study of electrodeposited and vapour deposited gold films : Fractal surface characterization through scanning tunnelling microscopy
Herrasti, P.
Ciencias Exactas
Química
Fractal surfaces
Scanning tunneling microscopy
Electrocrystallization
Metal vapour deposition
Gold electrodes
title_short A comparative study of electrodeposited and vapour deposited gold films : Fractal surface characterization through scanning tunnelling microscopy
title_full A comparative study of electrodeposited and vapour deposited gold films : Fractal surface characterization through scanning tunnelling microscopy
title_fullStr A comparative study of electrodeposited and vapour deposited gold films : Fractal surface characterization through scanning tunnelling microscopy
title_full_unstemmed A comparative study of electrodeposited and vapour deposited gold films : Fractal surface characterization through scanning tunnelling microscopy
title_sort A comparative study of electrodeposited and vapour deposited gold films : Fractal surface characterization through scanning tunnelling microscopy
dc.creator.none.fl_str_mv Herrasti, P.
Ocón, P.
Salvarezza, Roberto Carlos
Vara, J. M.
Vásquez, L.
Arvia, Alejandro Jorge
author Herrasti, P.
author_facet Herrasti, P.
Ocón, P.
Salvarezza, Roberto Carlos
Vara, J. M.
Vásquez, L.
Arvia, Alejandro Jorge
author_role author
author2 Ocón, P.
Salvarezza, Roberto Carlos
Vara, J. M.
Vásquez, L.
Arvia, Alejandro Jorge
author2_role author
author
author
author
author
dc.subject.none.fl_str_mv Ciencias Exactas
Química
Fractal surfaces
Scanning tunneling microscopy
Electrocrystallization
Metal vapour deposition
Gold electrodes
topic Ciencias Exactas
Química
Fractal surfaces
Scanning tunneling microscopy
Electrocrystallization
Metal vapour deposition
Gold electrodes
description The surfaces of Au deposits grown under non-equilibrium conditions from either the electroreduction of Au oxide or from the vapour have been analysed as fractals by measuring the perimeter (P) and the area (A) of intergranular voids. The values of P and A were determined from scanning tunnelling microscopy (STM) topographic imaging of the deposit surfaces. A frsctal behaviour P ∝ 4 <sup>D/2</sup> was found with D = 1.5 ± 0.1 and D = 1.7 ± 0.1 for the electrodeposited and vapour deposited Au iilms, respectively. These figures remain constant for film thicknesses between 100 and 1000 mn. The value of D, the fractal dimension of the surfaces, is 2.5 ± 0.1 for the Au electrodeposits, and 2.7 + 0.1 for the Au vapour deposited films. The former value is consistent with either a diffusion or an electric field controlled growth model, whereas the latter is in agreement with a ballistic growth model.
publishDate 1992
dc.date.none.fl_str_mv 1992
dc.type.none.fl_str_mv info:eu-repo/semantics/article
info:eu-repo/semantics/publishedVersion
Articulo
http://purl.org/coar/resource_type/c_6501
info:ar-repo/semantics/articulo
format article
status_str publishedVersion
dc.identifier.none.fl_str_mv http://sedici.unlp.edu.ar/handle/10915/118415
url http://sedici.unlp.edu.ar/handle/10915/118415
dc.language.none.fl_str_mv eng
language eng
dc.relation.none.fl_str_mv info:eu-repo/semantics/altIdentifier/issn/am-4686/9
dc.rights.none.fl_str_mv info:eu-repo/semantics/openAccess
http://creativecommons.org/licenses/by-nc-sa/4.0/
Creative Commons Attribution-NonCommercial-ShareAlike 4.0 International (CC BY-NC-SA 4.0)
eu_rights_str_mv openAccess
rights_invalid_str_mv http://creativecommons.org/licenses/by-nc-sa/4.0/
Creative Commons Attribution-NonCommercial-ShareAlike 4.0 International (CC BY-NC-SA 4.0)
dc.format.none.fl_str_mv application/pdf
2209-2214
dc.source.none.fl_str_mv reponame:SEDICI (UNLP)
instname:Universidad Nacional de La Plata
instacron:UNLP
instname_str Universidad Nacional de La Plata
instacron_str UNLP
institution UNLP
reponame_str SEDICI (UNLP)
collection SEDICI (UNLP)
repository.name.fl_str_mv SEDICI (UNLP) - Universidad Nacional de La Plata
repository.mail.fl_str_mv alira@sedici.unlp.edu.ar
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