Cita APA

López Gayou, V. (2012). FTIR and electrical characterization of a-Si: H layers deposited by PECVD at different boron ratios.

Citación estilo Chicago

López Gayou, Valentín. FTIR and Electrical Characterization of A-Si: H Layers Deposited By PECVD At Different Boron Ratios. 2012.

Cita MLA

López Gayou, Valentín. FTIR and Electrical Characterization of A-Si: H Layers Deposited By PECVD At Different Boron Ratios. 2012.