Landesman, J., Jiménez López, J. I., Levallois, C., Pommereau, F., Frigeri, C., Torres, A., . . . Rhallabi, A. (2016). Defect formation during chlorine-based dry etching and their effects on the electronic and structural properties of InP/InAsP quantum wells.
Citação norma ChicagoLandesman, Jean-Pierre, Juan Ignacio Jiménez López, Christophe Levallois, Frédéric Pommereau, Cesare Frigeri, Alfredo Torres, Yoan Le Ger, Alexandre Beck, y Ahmed Rhallabi. Defect Formation During Chlorine-based Dry Etching and Their Effects On the Electronic and Structural Properties of InP/InAsP Quantum Wells. 2016.
Citação norma MLALandesman, Jean-Pierre, et al. Defect Formation During Chlorine-based Dry Etching and Their Effects On the Electronic and Structural Properties of InP/InAsP Quantum Wells. 2016.